1
Nei Masahiro, Kobayashi Naoyuki, Arai Dai, Owa Soichi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Nei Masahiro, Kobayashi Naoyuki, Arai Dai, Owa Soichi, KAWAKITA Kijuro, June 24, 2004: WO/2004/053953 (526 worldwide citation)

(EN) An exposure apparatus, wherein an exposure of a substrate (P) is carried out by locally filling the image plane side of a projection optical system (PL) with a liquid (50) and projecting an image of a pattern onto the substrate (P) through the projection optical system (PL) and the liquid (50), ...


2
Mizutani Hideo, Magome Nobutaka: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Mizutani Hideo, Magome Nobutaka, KAWAKITA Kijuro, June 24, 2004: WO/2004/053958 (504 worldwide citation)

(EN) An exposure apparatus, wherein an exposure of a substrate (P) is carried out by filling at least a portion of the space between a projection optical system and the substrate (P) with a liquid and projecting an image of a pattern onto the substrate (P) through the projection optical system and t ...


3
Magome Nobutaka, Takaiwa Hiroaki, Arai Dai: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Magome Nobutaka, Takaiwa Hiroaki, Arai Dai, KAWAKITA Kijuro, June 24, 2004: WO/2004/053952 (501 worldwide citation)

(EN) An exposure apparatus, wherein an exposure is carried out while filling a space between a projection optical system and a substrate with a liquid, enables to suppress deterioration of a device caused by adherent liquid on the substrate. A device manufacturing system (SYS) comprises an exposure ...


4
Nei Masahiro, Kobayashi Naoyuki, Chiba Hiroshi, Hirukawa Shigeru: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Nei Masahiro, Kobayashi Naoyuki, Chiba Hiroshi, Hirukawa Shigeru, KAWAKITA Kijuro, June 24, 2004: WO/2004/053954 (469 worldwide citation)

(EN) An exposure apparatus (EX) carries out an exposure of a substrate (P) by filling the space between a projection optical system (PL) and the substrate (P) with a liquid (50) and projecting an image of a pattern onto the substrate (P) through the liquid (50) using the projection optical system (P ...


5
Owa Soichi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Owa Soichi, KAWAKITA Kijuro, June 24, 2004: WO/2004/053950 (462 worldwide citation)

(EN) An exposure apparatus, wherein exposure is carried out while filling a space between a projection optical system and a substrate with a liquid, enables to suppress deterioration of a pattern image caused by air bubbles in the liquid. The exposure apparatus comprises a liquid supply unite (1) fo ...


6
Magome Nobutaka, Nei Masahiro, Hirukawa Shigeru, Kobayashi Naoyuki, Owa Soichi: (Ja) 露光方法及び露光装置並びにデバイス製造方法, (En) Exposure method, exposure apparatus and method for manufacturing device. Nikon Corporation, Magome Nobutaka, Nei Masahiro, Hirukawa Shigeru, Kobayashi Naoyuki, Owa Soichi, KAWAKITA Kijuro, June 24, 2004: WO/2004/053951 (457 worldwide citation)

(EN) When a substrate (P) is exposed to light through a projection optical system, a liquid (50) is supplied between the projection optical system and the substrate (P). Accordingly, a pattern forming area (AR1) of the substrate (P) is exposed to light through a projection optical system (PL) and th ...


7
Hara Hideaki: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Hara Hideaki, SHIGA Masatake, October 21, 2004: WO/2004/090956 (166 worldwide citation)

(EN) An exposure apparatus (EX) is disclosed wherein an image of a pattern is projected onto a substrate (P) via a projection optical system (PL) and the substrate (P) is exposed to light. The exposure apparatus (EX) comprises a movable substrate stage (PST) for holding the substrate (P) above the p ...


8
Nei Masahiro, Kobayashi Naoyuki, Arai Dai, Owa Soichi: Exposure apparatus and method for manufacturing device. Nippon Kogaku, September 7, 2005: EP1571695-A1 (109 worldwide citation)

An exposure apparatus exposes a substrate P by locally filling a side of an image plane of a projection optical system PL with a liquid 50 and projecting an image of a pattern onto the substrate P through the liquid 50 and the projection optical system PL. The exposure apparatus includes a recovery ...


9
Hiroyuki Nagasaka, Takashi Aoki: Exposure method, exposure apparatus, and method for manufacturing device. Nikon Corporation, Oliff & Berridge, August 29, 2006: US07098991 (106 worldwide citation)

According to one embodiment of the invention, a pattern of a mask is transferred onto a substrate via a projection optical system using an energy beam by placing a substrate on side of an energy beam emitting end portion of projection optical system, when the substrate is exposed, and placing an obj ...


10
Nagasaka Hiroyuki, Okuyama Takeshi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Nikon Engineering, Nagasaka Hiroyuki, Okuyama Takeshi, SHIGA Masatake, January 20, 2005: WO/2005/006415 (89 worldwide citation)

(EN) An exposure apparatus is disclosed wherein an exposure of a substrate is carried out by forming an immersion region on a part of the substrate and projecting a pattern image onto the substrate through a liquid which forms the immersion region and a projection optical system. The exposure appara ...