1
Omura Yasuhiro, Ikezawa Hironori, Williamson David M: Projection optical system and method for photolithography and exposure apparatus and method using same. Nikon Corporation, Omura Yasuhiro, Ikezawa Hironori, Williamson David M, HASEGAWA Yoshiki, March 4, 2004: WO/2004/019128 (891 worldwide citation)

Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path befo ...


2
Hiroshi Fukuda, Rudolf Murai von Bunau: Projection exposure apparatus and method which uses multiple diffraction gratings in order to produce a solid state device with fine patterns. Hitachi, Kenyon & Kenyon, February 3, 1998: US05715039 (762 worldwide citation)

In exposing and projecting a mask onto a substrate using projection optics, a first grating is provided between the substrate and the projection optics and a second grating is provided between the projection optics and the mask so that the image of the mask pattern is formed near the substrate surfa ...


3
Kyoichi Suwa: Projection exposure apparatus and method with workpiece area detection. Nikon Precision, Norman R Klivans, Mark E Schmidt, Skjerven Morrill MacPherson, February 20, 2001: US06191429 (540 worldwide citation)

Improvements in a focusing apparatus having an objective optical system for optically manufacturing a workpiece, forming a desired pattern on a surface of a workpiece or inspecting a pattern on a workpiece and used to adjust the state of focusing between the surface of the workpiece and the objectiv ...


4
Nei Masahiro, Kobayashi Naoyuki, Arai Dai, Owa Soichi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Nei Masahiro, Kobayashi Naoyuki, Arai Dai, Owa Soichi, KAWAKITA Kijuro, June 24, 2004: WO/2004/053953 (526 worldwide citation)

(EN) An exposure apparatus, wherein an exposure of a substrate (P) is carried out by locally filling the image plane side of a projection optical system (PL) with a liquid (50) and projecting an image of a pattern onto the substrate (P) through the projection optical system (PL) and the liquid (50), ...


5

6
Mizutani Hideo, Magome Nobutaka: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Mizutani Hideo, Magome Nobutaka, KAWAKITA Kijuro, June 24, 2004: WO/2004/053958 (504 worldwide citation)

(EN) An exposure apparatus, wherein an exposure of a substrate (P) is carried out by filling at least a portion of the space between a projection optical system and the substrate (P) with a liquid and projecting an image of a pattern onto the substrate (P) through the projection optical system and t ...


7
Magome Nobutaka, Takaiwa Hiroaki, Arai Dai: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Magome Nobutaka, Takaiwa Hiroaki, Arai Dai, KAWAKITA Kijuro, June 24, 2004: WO/2004/053952 (501 worldwide citation)

(EN) An exposure apparatus, wherein an exposure is carried out while filling a space between a projection optical system and a substrate with a liquid, enables to suppress deterioration of a device caused by adherent liquid on the substrate. A device manufacturing system (SYS) comprises an exposure ...


8
Nei Masahiro, Kobayashi Naoyuki, Chiba Hiroshi, Hirukawa Shigeru: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Nei Masahiro, Kobayashi Naoyuki, Chiba Hiroshi, Hirukawa Shigeru, KAWAKITA Kijuro, June 24, 2004: WO/2004/053954 (469 worldwide citation)

(EN) An exposure apparatus (EX) carries out an exposure of a substrate (P) by filling the space between a projection optical system (PL) and the substrate (P) with a liquid (50) and projecting an image of a pattern onto the substrate (P) through the liquid (50) using the projection optical system (P ...


9
Owa Soichi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Owa Soichi, KAWAKITA Kijuro, June 24, 2004: WO/2004/053950 (462 worldwide citation)

(EN) An exposure apparatus, wherein exposure is carried out while filling a space between a projection optical system and a substrate with a liquid, enables to suppress deterioration of a pattern image caused by air bubbles in the liquid. The exposure apparatus comprises a liquid supply unite (1) fo ...


10
Magome Nobutaka, Nei Masahiro, Hirukawa Shigeru, Kobayashi Naoyuki, Owa Soichi: (Ja) 露光方法及び露光装置並びにデバイス製造方法, (En) Exposure method, exposure apparatus and method for manufacturing device. Nikon Corporation, Magome Nobutaka, Nei Masahiro, Hirukawa Shigeru, Kobayashi Naoyuki, Owa Soichi, KAWAKITA Kijuro, June 24, 2004: WO/2004/053951 (457 worldwide citation)

(EN) When a substrate (P) is exposed to light through a projection optical system, a liquid (50) is supplied between the projection optical system and the substrate (P). Accordingly, a pattern forming area (AR1) of the substrate (P) is exposed to light through a projection optical system (PL) and th ...