1
Shigeru Hirukawa: Exposure apparatus and device manufacturing method. Nikon Corporation, Oliff & Berridge, October 14, 2008: US07436486 (113 worldwide citation)

A lithographic projection apparatus includes an illumination system arranged to condition a radiation beam, a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern, a substrate table configured to hold a substrate ...


2
Mitsuru Inoue: Positioning stage device exposure apparatus and device manufacturing method utilizing the same. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, November 11, 1997: US05685232 (110 worldwide citation)

A positioning stage device capable of regulating in a wide range the rotational angle of a Z-stage supporting a suction chuck. The suction chuck is constructed integrally with the Z-stage, which is supported by a bearing so as to be movable along the Z-axis and rotatable about the Z-axis. A rotation ...


3
Shigeru Hirukawa: Exposure apparatus and device manufacturing method. Nikon Corporation, Oliff & Berridge, December 29, 2009: US07639343 (109 worldwide citation)

An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted and that moves within a two-dimensional plane holding the substrate. In addi ...


4
Shigeru Hirukawa: Exposure apparatus and device manufacturing method. Nikon Corporation, Oliff & Berridge, September 15, 2009: US07589821 (108 worldwide citation)

A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent to the substrate. The apparatus includes a liquid diverter in the space to promote liquid flow across the space.


5
Shigeru Hirukawa, Issey Tanaka: Exposure apparatus and device manufacturing method. Nikon Corporation, Oliff & Berridge, March 17, 2009: US07505111 (102 worldwide citation)

An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted that moves within a two-dimensional plane holding the substrate. The apparat ...


6
Shigeru Hirukawa: Exposure apparatus and device manufacturing method. Nikon Corporation, Oliff & Berridge, November 4, 2008: US07446851 (101 worldwide citation)

In a lithographic projection apparatus includes an illumination system arranged to condition a radiation beam, a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern, a substrate table configured to hold a substr ...


7
Honda Tokuyuki: Exposure apparatus and device manufacturing method. Canon Kabushiki Kaisha, Honda Tokuyuki, FUJIMOTO Ryosuke, July 7, 2005: WO/2005/062351 (100 worldwide citation)

An exposure apparatus includes a projection optical system (3) for projecting a pattern of a mask (2) onto a substrate (5), and a fluid supply unit (6) for supplying a fluid between said projection optical system and the substrate, said fluid supply unit (6) including an injection unit (19) for inje ...


8
Akimitsu Ebihara: Exposure apparatus, and device manufacturing method. Nikon Corporation, Oliff & Berridge, January 22, 2008: US07321419 (80 worldwide citation)

A hydrostatic bearing is provided opposite to a wafer on a table. The hydrostatic bearing maintains the distance between the bearing surface and the wafer in the direction of the optical axis of a projection optical system at a predetermined value.


9
Honda Tokuyuki: Exposure apparatus and device manufacturing method. Canon Kabushiki Kaisha, Honda Tokuyuki, FUJIMOTO Ryosuke, May 26, 2005: WO/2005/048328 (79 worldwide citation)

An exposure apparatus includes a projection optical system 3 for projecting a pattern on a mask 3 onto a substrate 5, a stage 13 for retaining and moving the substrate, and liquid film forming means (10, 11) for forming a liquid film 4 between a final surface of the projection optical system and the ...


10
Yasuyuki Unno: Projection exposure apparatus and device manufacturing method capable of controlling polarization direction. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, August 3, 1999: US05933219 (77 worldwide citation)

In a projection apparatus and method, a mask and a substrate are scanned relative to an exposure beam in a scanning direction, with the exposure beam having a direction of polarization. The mask contains at least first and second patterns, with the first pattern extending in a different longitudinal ...