1
Kenji Nishi: Exposure apparatus, substrate processing system, and device manufacturing method. Nikon Corporation, Oblon Spivak McClelland Maier & Neustadt P C, February 8, 2005: US06853443 (65 worldwide citation)

A first main body unit for supporting a substrate stage is supported at four points by vibration isolators, and a second main body unit is supported on the first main body unit at three points by second vibration isolators. This allows the first main body unit and the substrate stage to be supported ...


2
Nishi Kenji: Exposure apparatus, substrate processing system, and device manufacturing method. Nippon Kogaku, wu yuqin gu gongxia, July 6, 2005: CN02801062

A first main body unit (ST1) supporting a substrate stage (WST1) is supported at four points by an antivibration unit (16A, 16B, etc.) and a second main body unit (ST2) holding a projection optical system (PL) is supported at three points on the first main body unit by a second antivibration unit (2 ...