1
Yutaka Hayashi: Exposure apparatus, exposure method, and device manufacturing method. Nikon Corporation, Oblon Spivak McClelland Maier & Neustadt P C, October 14, 2003: US06633364 (85 worldwide citation)

The exposure apparatus comprises a gas supply system that supplies a low absorptive gas with a predetermined purity to the illumination system housing and the barrel of the projection optical system and collects the gas exhausted from these closed spaces and supplies the gas to the mask chamber whic ...


2
Nagasaka Hiroyuki: (Ja) 露光装置及び露光方法、並びにデバイス製造方法, (En) Exposure apparatus, exposure method and device manufacturing method. Nikon Corporation, Nagasaka Hiroyuki, SHIGA Masatake, May 18, 2007: WO/2007/055237 (62 worldwide citation)

(EN) An exposure apparatus (EX) performs multiple exposure of a substrate (P). The exposure apparatus is provided with a first station (ST1) for exposing the substrate (P); a second station (ST2) for exposing the substrate (P) exposed by the first station (ST1); movable members (4, 5) which can move ...


3
Jun Ishikawa: Exposure apparatus, exposure method, and device manufacturing method. Nikon Corporation, Oblon Spivak McClelland Maier & Neustadt P C, July 5, 2005: US06914665 (34 worldwide citation)

A fiducial plate on which at least one pinhole shaped pattern is formed is fixed on a mask stage, which moves holding a mask. Therefore, for example, wavefront aberration of a projection optical system can be measured without using any special kind of masks for measurement, by setting a wavefront me ...


4
Nagasaka Hiroyuki, Okuyama Takeshi: Exposure apparatus, exposure method, and device manufacturing method. Nikon, Nikon Engineering, June 22, 2006: JP2006-165500 (29 worldwide citation)

PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of performing satisfactory exposure processing while maintaining a liquid immersion region in a desired state.SOLUTION: The exposure apparatus EX irradiates a board (P) with exposure light EL via a projection optical system PL and a liqu ...


5
Inoue Hideya, Kiuchi Tohru: (Ja) 露光装置及び露光方法、並びにデバイス製造方法, (En) Exposure apparatus, exposure method and device manufacturing method. Nikon Corporation, Inoue Hideya, Kiuchi Tohru, TATEISHI Atsuji, May 24, 2007: WO/2007/058188 (19 worldwide citation)

(EN) A pattern image is generated by pattern image forming apparatuses (10, 12, PL), and at least a part of the generated pattern image or a part of a pattern image generated and formed on a substance is photoelectrically detected by detecting systems (42, 48). Then, a modifying apparatus (32) modif ...


6
Shinji Sato: Exposure apparatus, exposure method, and device manufacturing method. Nikon Corporation, Oliff, November 25, 2014: US08896806 (18 worldwide citation)

An exposure apparatus that exposes a substrate includes: an optical system that includes an emission surface from which an exposure light is emitted; a first surface that is disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface; a sec ...


7
Hideya Inoue, Tohru Kiuchi: Exposure apparatus, exposure method, and device manufacturing method. Nikon Corporation, Miles & Stockbridge P C, August 11, 2009: US07573052 (16 worldwide citation)

A pattern image generation device generates a pattern image, and at least a part of the pattern image which has been generated or the pattern image which is generated and is formed on an object is photoelectrically detected by a detection system. Then, a correction device corrects design data that s ...


8
Shinji Wakui: Active vibration isolator, exposure apparatus, exposure method and device manufacturing method. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, September 11, 2001: US06286644 (16 worldwide citation)

An active vibration isolator includes a vibration isolation platform on which an object to be isolated from vibration is mounted, an air-spring actuator which supports the vibration isolation platform, the air-spring actuator including a valve, which is subjected to feedback drive, a vibration measu ...


9
Takashi Aoki, Soichi Owa: Exposure apparatus, exposure method, and device manufacturing method. Nikon Corporation, Oliff & Berridge, September 2, 2003: US06614504 (13 worldwide citation)

An exposure apparatus of the present invention provides a mask having a first space formed by a protection member, which protects a pattern formation area on a mask substrate, and a frame, which supports the protection member, inside a second space, and transfers the pattern of the mask provided in ...


10
Hideaki Hara, Hiroaki Takaiwa, Dai Arai: Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method. Nikon Corporation, Oliff & Berridge, November 2, 2010: US07826031 (12 worldwide citation)

An exposure apparatus exposes a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid that fills a gap between the projection optical system and the substrate. The exposure apparatus has a liquid recovery mechanism with a drive section powered ...