1
Shinji Sato: Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium. NIKON CORPORATION, Oliff, February 23, 2016: US09268231 (4 worldwide citation)

A liquid immersion member forms a liquid immersion space on an object which is movable below an optical member so that an optical path of exposure light emitted from an emitting surface of the optical member is filled with liquid. The liquid immersion member includes a first member that has a first ...


2
Shinji Sato: Exposure apparatus, exposing method, method for manufacturing device, program, and recording medium. NIKON CORPORATION, Oliff, November 29, 2016: US09507265 (2 worldwide citation)

An exposure apparatus includes a liquid immersion member including a first member and a second member and configured to form a liquid immersion space of the liquid, a driving apparatus configured to move the second member with respect to the first member; and a controller configured to control the d ...


3
Shinji Sato: Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium. NIKON CORPORATION, Oliff, February 27, 2018: US09904184 (1 worldwide citation)

A liquid immersion member is used in a liquid immersion exposure apparatus, and is capable of forming a liquid immersion space on a surface of an object opposite to an emitting surface of an optical member which emits exposure light. The liquid immersion member includes a first member that includes ...


4
Shinji Sato: Exposure apparatus, exposing method, method for manufacturing device, program, and recording medium. NIKON CORPORATION, Oliff, March 13, 2018: US09915882

An exposure apparatus that exposes a substrate by exposure light via liquid between an optical member and the substrate, the exposure apparatus includes: an apparatus frame, an optical system including the optical member, a liquid immersion member that is configured to form an immersion liquid space ...


5
Shinji Sato: Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium. NIKON CORPORATION, Oliff, November 21, 2017: US09823580

A liquid immersion member is used in a liquid immersion exposure apparatus which exposes a substrate via liquid by exposure light, and forms a liquid immersion space above an object which is movable below the optical member. The liquid immersion member includes a first member that is disposed at at ...


6
Shinji Sato: Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium. NIKON CORPORATION, Oliff, June 26, 2018: US10007189

A liquid immersion member is used in a liquid immersion exposure apparatus, and forms a liquid immersion space above an object which is movable below the optical member. The liquid immersion member includes a first member that is disposed at at least a portion of surrounding of the optical member, a ...


7
Shinji Sato: Exposure apparatus, exposing method, method for manufacturing device, program, and recording medium. NIKON CORPORATION, Oliff, January 2, 2018: US09857700

An exposure apparatus includes a liquid immersion member including a first member and a second member and configured to form a liquid immersion space of the liquid, a driving apparatus configured to move the second member with respect to the first member; and a controller configured to control the d ...


8
Shinji Sato: Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium. NIKON CORPORATION, Oliff, January 31, 2017: US09557654

A liquid immersion exposure apparatus includes a projection system having a final element and a liquid immersion member that forms a liquid immersion space under the final element. The liquid immersion member includes a first member that surrounds the final element and that has a liquid supply port ...


9
Shinji Sato: Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium. NIKON CORPORATION, Oliff, March 27, 2018: US09927724

A liquid immersion exposure apparatus is disclosed. It includes a projection system having a final element and a liquid immersion member that in turn includes a first member, which surrounds the final element and has a liquid supply port and a liquid suction port, and a second member, which is movab ...


10
LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, EXPOSING METHOD, METHOD FOR MANUFACTURING DEVICE, PROGRAM, AND RECORDING MEDIUM. NIKON CORPORATION, October 10, 2013: US20130265556-A1

A liquid immersion member forms a liquid immersion space on an object which is movable below an optical member so that an optical path of exposure light emitted from an emitting surface of the optical member is filled with liquid. The liquid immersion member includes a first member that has a first ...