1
Shinji Sato: Exposure apparatus, exposing method, device manufacturing method, program, and recording medium. NIKON CORPORATION, Oliff, February 14, 2017: US09568828 (2 worldwide citation)

A liquid immersion member including first and second members forming the immersion space; first member having a first lower surface disposed at a portion of the optical member surrounding, second member having a second upper surface opposite to the first lower surface via a gap and a second lower su ...


2
Shinji Sato: Exposure apparatus, exposing method, device manufacturing method, program, and recording medium. NIKON CORPORATION, Oliff, November 15, 2016: US09494870 (1 worldwide citation)

An exposure apparatus exposes a substrate by exposure light via liquid between an emitting surface of an optical member and the substrate. The exposure apparatus includes: a liquid immersion member configured to form an immersion liquid space on an object and including a first and second member, the ...


3
Shinji Sato: Exposure apparatus, exposing method, device manufacturing method, program, and recording medium. NIKON CORPORATION, Oliff, March 6, 2018: US09910365

A liquid immersion member including first and second members forming the immersion space; first member having a first lower surface disposed at a portion of the optical member surrounding, second member having a second upper surface opposite to the first lower surface via a gap and a second lower su ...


4
EXPOSURE APPARATUS, EXPOSING METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM. September 11, 2014: US20140253886-A1

An exposure apparatus exposes a substrate by exposure light via liquid between an emitting surface of an optical member and the substrate. The exposure apparatus includes: a liquid immersion member configured to form an immersion liquid space on an object and including a first and second member, the ...


5
EXPOSURE APPARATUS, EXPOSING METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM. October 16, 2014: US20140307235-A1

A liquid immersion member including first and second members forming the immersion space; first member having a first lower surface disposed at a portion of the optical member surrounding, second member having a second upper surface opposite to the first lower surface via a gap and a second lower su ...


6
EXPOSURE APPARATUS, EXPOSING METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM. NIKON CORPORATION, March 2, 2017: US20170060002-A1

An exposure apparatus that exposes a substrate by exposure light via liquid between an optical member and the substrate includes: a liquid immersion member that forms an immersion liquid space on an object and comprises first and second members, the first member disposed at at least a portion of sur ...


7
EXPOSURE APPARATUS, EXPOSING METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM. NIKON CORPORATION, May 18, 2017: US20170139331-A1

A liquid immersion member including first and second members forming the immersion space; first member having a first lower surface disposed at a portion of the optical member surrounding, second member having a second upper surface opposite to the first lower surface via a gap and a second lower su ...