1
Ota Koji: Etching composition liquid. Asahi Kagaku Kogyo, April 27, 2006: JP2006-111933 (2 worldwide citation)

PROBLEM TO BE SOLVED: To provide etching composition liquid which has more excellent restraining effect for side etching and can quickly etch exposed portion (41) in a copper thin film.SOLUTION: The etching composition liquid contains the following component (a) to component (f) and the surface tens ...


2
Amy M Tseng, Brian V Jenkins, Robert M Mack: Control over etching molecule levels in etching compositions. ECOLAB USA, Leydig Voit & Mayer, June 13, 2017: US09677998

A method of detecting and measuring the presence of ammonium fluoride in a buffered oxide etchant (“BOE”) composition is provided. The method comprises contacting a BOE composition with a chromogenic agent selected from bromothymol blue, Eosin-Bluish, indophenol blue, bromocresol green, orthophthald ...


3
Ota Koji: Etching composition liquid. Asahi Kagaku Kogyo, October 12, 2006: JP2006-274291

PROBLEM TO BE SOLVED: To provide an etching composition liquid having more excellent side etching suppression effect, and capable of swiftly etching the exposed part (41) of a copper thin film.SOLUTION: The composition liquid comprises: (a) a cupric chloride component; (b) a hydrogen chloride compon ...



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