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Young Bae
Young C Bae, Robert J Kavanagh: Cyanoadamantyl compounds and polymers and photoresists comprising same. Rohm and Haas Electronic Materials, Peter F Corless, Darryl P Frickey, Edwards Angell Palmer Dodge, September 18, 2007: US07270935

Cyanoadamantyl compounds, polymers that comprise polymerized units of such compounds, and photoresist compositions that comprise such polymers are provided. Preferred polymers of the invention are employed in photoresists imaged at wavelengths less than 250 nm such as 248 nm and 193 nm.


2
Young Bae
Young C Bae, Robert J Kavanagh: Cyanoadamantyl compounds and polymers and photoresists comprising same. Rohm and Haas Electronic Materials, Edwards & Angell, September 22, 2005: US20050208417-A1

Cyanoadamantyl compounds, polymers that comprise polymerized units of such compounds, and photoresist compositions that comprise such polymers are provided. Preferred polymers of the invention are employed in photoresists imaged at wavelengths less than 250 nm such as 248 nm and 193 nm.


3
Bae Young C, Kavanagh Robert J: Cyanoadamantyl compounds and polymers and photoresists comprising same. Rohm And Haas Electronic Mater, tao jiarong, October 19, 2005: CN200510054399

Cyanoadamantyl compounds, polymers that comprise polymerized units of such compounds, and photoresist compositions that comprise such polymers are provided. Preferred polymers of the invention are employed in photoresists imaged at wavelengths less than 250 nm such as 248 nm and 193 run.


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