1
Charles Szmanda
James W Thackeray, Gerald B Wayton, Charles R Szmanda: Coating compositions for use with an overcoated photoresist. Rohm and Haas Electronic Materials, Peter F Corless, Darryl P Frickey, Edwards Angell Palmer & Dodge, September 8, 2009: US07585612 (26 worldwide citation)

Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive followi ...


2
John Amara
John P Amara, Nicola Pugliano, Jin Wuk Sung, Michael K Gallagher, Michael S Castorano: Coating compositions for use with an overcoated photoresist. Rohm and Haas Electronic Materials, Peter F Corless, Rohm and Haas Electronic Materials, June 11, 2009: US20090148789-A1

In one aspect, the invention relates to silicon-containing organic coating compositions, particularly antireflective coating compositions, that contain a repeat unit wherein chromophore moieties such as phenyl are spaced from Si atom(s). In another aspect, silicon-containing underlayer compositions ...


3
Charles Szmanda
James W Thackeray, Gerald B Wayton, Charles R Szmanda: Coating compositions for use with an overcoated photoresist. Rohm and Haas Electronic Materials, Rohm And Haas Electronic Materials, February 22, 2007: US20070042289-A1

Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive followi ...


4
Maricela Morales
Gerald B Wayton, Peter Trefonas, Suzanne Coley, Tomoki Kurihara: Coating compositions for use with an overcoated photoresist. Shipley Company, Edwards & Angell, Dike Bronstein Robert & Cushman IP Group, April 8, 2004: US20040067437-A1 (1 worldwide citation)

In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a component such as a resin that comprises an aryl dicarboxylate group. In a further aspect, organic coating compositions are provided, particularly spin-on antireflec ...


5
Maricela Morales
Suzanne Coley, Peter Trefonas, Patricia E Fallon, Gerald B Wayton: Coating compositions for use with an overcoated photoresist. Rohm and Haas Electronic Materials, Edwards & Angell, March 30, 2006: US20060068335-A1

Compositions and methods are provided that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred coating composition and methods of the invention can provide enhanced resolution of a patter ...


6
Maricela Morales
Gerald B Wayton, Peter Trefonas, Min Ho Jung: Coating compositions for use with an overcoated photoresist. Rohm and Haas Electronic Materials, Edwards & Angell, March 16, 2006: US20060057491-A1

Compositions (particularly antireflective coating compositions or “ARCs”) are provided that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. More particularly, the invention relates to organic c ...


7
Maricela Morales
Gerald B Wayton, Peter Trefonas, Suzanne Coley, Tomoki Kurihara: Coating compositions for use with an overcoated photoresist. Shipley Company, Edwards & Angell, September 25, 2003: US20030180559-A1

In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compou ...


8
Maricela Morales
Gerald B Wayton, Peter Trefonas, Suzanne Coley, Tomoki Kurihara: Coating compositions for use with an overcoated photoresist. Shipley Company, Edwards & Angell, October 21, 2004: US20040209200-A1

In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compou ...


9
Maricela Morales
Gerald B Wayton, Peter Trefonas, Suzzanne Coley, Tomoki Kurihara: Coating compositions for use with an overcoated photoresist. Shipley Company, Peter F Corless, Rohm and Haas Electronic Materials, April 26, 2007: US20070092746-A1

In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compou ...


10
Vaishali Raghu Vohra, James W Thackeray, Gerald B Wayton: Coating compositions for use with an overcoated photoresist. Rohm and Haas Electronics Materials, Peter F Corless, Darryl P Frickey, Edwards Angell Palmer & Dodge, April 5, 2011: US07919222 (24 worldwide citation)

Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive followi ...