1
Yim Bun P Kwan: Balanced positioning system for use lithographic apparatus. ASML Netherlands, Pillsbury Winthrop, September 10, 2002: US06449030 (75 worldwide citation)

A balanced positioning system for use in lithographic apparatus having a pair of balance masses which are supported so as to be moveable in at least one degree of freedom, such as Y translation. Oppositely directed drive forces in this degree of freedom act directly between the driven body and the b ...


2
Yim Bun P Kwan, Wilhelmus J T P van de Wiel: Balanced positioning system for use in lithographic apparatus. ASML Netherlands, Pillsbury Winthrop, February 25, 2003: US06525803 (18 worldwide citation)

A balanced positioning apparatus comprises a balance mass which is supported so as to be moveable in the three degrees of freedom, such as X and Y translations and rotation about the Z-axis. Drive forces in these degrees of freedom act directly between the positioning body and the balance mass. Reac ...


3
Kwan Yim Bun Patrick: Lithographic apparatus with a balanced positioning system. Asm Lithography, June 27, 2001: EP1111470-A2 (10 worldwide citation)

A balanced positioning system for use in lithographic apparatus comprises a pair of balance masses (20,30) which are supported so as to be moveable in at least one degree of freedom, such as Y translation. Oppositely directed drive forces in this degree of freedom act directly between the driven bod ...


4
Yim Bun P Kwan: Balanced positioning system for use in lithographic apparatus. ASML Netherlands, Pillsbury Winthrop, December 30, 2003: US06671036 (8 worldwide citation)

A balanced positioning system for use in lithographic apparatus having a pair of balance masses which are supported so as to be moveable in at least one degree of freedom, such as Y translation. Oppositely directed drive forces in this degree of freedom act directly between the driven body and the b ...


5
Yim Bun P Kwan, Wilhelmus J T P van de Wiel: Balanced positioning system for use in lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 25, 2006: US07034920 (3 worldwide citation)

A balanced positioning apparatus comprises a balance mass which is supported so as to be moveable in the three degrees of freedom, such as X and Y translation and rotation about the Z-axis. Drive forces in these degrees of freedom act directly between the positioning body and the balance mass. React ...


6
Yim Bun P Kwan: Balanced positioning system for use in lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 2, 2005: US06924882 (1 worldwide citation)

A balanced positioning system for use in lithographic apparatus having a pair of balance masses which are supported so as to be moveable in at least one degree of freedom, such as Y translation. Oppositely directed drive forces in this degree of freedom act directly between the driven body and the b ...


7
Yim Bun P Kwan, Wilhelmus J T P van de Wiel: Balanced positioning system for use in lithographic apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 10, 2007: US07202937 (1 worldwide citation)

A balanced positioning apparatus comprises a balance mass which is supported so as to be moveable in the three degrees of freedom, such as X and Y translation and rotation about the Z-axis. Drive forces in these degrees of freedom act directly between the positioning body and the balance mass. React ...


8
Kwan Yimbun Patrick, Van de Wiel Wilhelmus Jacobus Theodorus Petrus: Balanced positioning system for use in lithographic apparatus. Asml Netherlands, October 21, 2006: TWI264617 (1 worldwide citation)

A balanced positioning apparatus comprises a balance mass which is supported so as to be moveable in the three degrees of freedom, such as X and Y translations and rotation about the Z-axis. Dave forces in these degrees of freedom act directly between the positioning body and the balance mass. React ...


9
Yim Bun P Kwan, Wilhelmus JTP van de Wiel: Balanced positioning system for use in lithographic apparatus. Pillsbury Madison & Sutro, July 5, 2001: US20010006762-A1

A balanced positioning apparatus comprises a balance mass which is supported so as to be moveable in the three degrees of freedom, such as X and Y translations and rotation about the Z-axis. Drive forces in these degrees of freedom act directly between the positioning body and the balance mass. Reac ...


10
Yim Bun P Kwan: Balanced positioning system for use in lithographic apparatus. Asml Netherlands, Pillsbury Winthrop, March 4, 2004: US20040041994-A1

A balanced positioning system for use in lithographic apparatus having a pair of balance masses which are supported so as to be moveable in at least one degree of freedom, such as Y translation. Oppositely directed drive forces in this degree of freedom act directly between the driven body and the b ...