Derk Jan Wilfred Klunder, Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Maarten Marinus Johannes Wilhelmus Van Herpen: Apparatus including a radiation source, a filter system for filtering particles out of radiation emitted by the source, and a processing system for processing the radiation, a lithographic apparatus including such an apparatus, and a method of filtering particles o. Asml Netherlands, Pillsbury Winthrop Shaw Pittman, July 13, 2006: US20060151717-A1

Particles emitted by a radiation source, and moving from the radiation source towards a processing system for processing the radiation from the radiation source, are filtered out of radiation propagating through a predetermined cross section of the radiation as emitted by the radiation source by a f ...