1
Jong Chul Lee, Sang Hyuck Park: Apparatus for treating thin film and method of treating thin film. LG DISPLAY, Brinks Gilson & Lione, December 1, 2015: US09200369

An apparatus and method for treating a thin film on a substrate is presented. The substrate is loaded on a fixed stage adapted to receive the substrate. An energy source is aligned through a space in a gas shield so as to face a thin film on the substrate to be repaired after the substrate is loaded ...


2
Jong Chul Lee, Je Sup Lee, Sang Hyuck Park: Apparatus for treating thin film and method of treating thin film. LG Display, Brinks Hofer Gilson & Lione, November 16, 2010: US07833350

An apparatus for treating a substrate includes a stage adapted to receive the substrate; a gas shield facing the substrate and having a retention space, the gas shield including: a top plate; a bottom plate facing the substrate and having pump holes around the retention space; and a middle plate bet ...


3
Jong Chul Lee, Sang Hyuck Park: Apparatus for treating thin film and method of treating thin film. Lg Philips Lcd, Brinks Hofer Gilson & Lione, July 6, 2006: US20060144687-A1

An apparatus and method for treating a thin film on a substrate is presented. The substrate is loaded on a fixed stage adapted to receive the substrate. An energy source is aligned through a space in a gas shield so as to face a thin film on the substrate to be repaired after the substrate is loaded ...


4
Jong Chul Lee, Je Sup Lee, Sang Hyuck Park: Apparatus for treating thin film and method of treating thin film. Lg Philips Lcd, LG Electronics, Brinks Hofer Gilson & Lione, March 23, 2006: US20060060140-A1

An apparatus for treating a substrate includes a stage adapted to receive the substrate; a gas shield facing the substrate and having a retention space, the gas shield including: a top plate; a bottom plate facing the substrate and having pump holes around the retention space; and a middle plate bet ...


5
Jong Chul Lee, Soung Yeoul Eom, Sang Hyuck Park: Apparatus for treating thin film and method of treating thin film. Lg Philips Lcd, Brinks Hofer Gilson & Lione, March 30, 2006: US20060068121-A1

An apparatus for treating a thin film on a substrate includes a stage on which the substrate is disposed. A gas shield faces the substrate. An energy source irradiates a part of the substrate with light emitted therefrom through a retention space of the gas shield. A dispense unit includes a pin noz ...


6
Lee Jong Chul, Park Sang Hyuck: Apparatus for treating thin film and method of treating thin film. Lg Philips Lcd, xu jinguo qi jianguo, July 5, 2006: CN200510109062

An apparatus and method for treating a thin film on a substrate is presented. The substrate is loaded on a fixed stage adapted to receive the substrate. An energy source is aligned through a space in a gas shield so as to face a thin film on the substrate to be repaired after the substrate is loaded ...


7
Lee Jong Chul, Lee Je Sup, Park Sang Hyuck: Apparatus for treating thin film and method of treating thin film. Lg Philips Lcd, xu jinguo qi jianguo, March 29, 2006: CN200510104886

An apparatus for treating a substrate includes a stage adapted to receive the substrate; a gas shield facing the substrate and having a retention space, the gas shield including: a top plate; a bottom plate facing the substrate and having pump holes around the retention space; and a middle plate bet ...


8
Lee Jong Chul, Eom Soung Yeoul, Park Sang Hyuck: Apparatus for treating thin film and method of treating thin film. Lg Philips Lcd, huang lunwei, April 5, 2006: CN200510095956

An apparatus for treating a thin film on a substrate includes a stage on which the substrate is disposed. A gas shield faces the substrate. An energy source irradiates a part of the substrate with light emitted therefrom through a retention space of the gas shield. A dispense unit includes a pin noz ...


9

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Lee Jong Chul, Lee Je Sup, Park Sang Hyuck: Apparatus for treating thin film and method of treating thin film. Lg Philips Lcd, LG Electronics, April 1, 2006: TW200610829

An apparatus for treating a substrate includes a stage adapted to receive the substrate; a gas shield facing the substrate and having a retention space, the gas shield including: a top plate; a bottom plate facing the substrate and having pump holes around the retention space; and a middle plate bet ...



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