1
Poon Alex Ka Tim, Kho Leonard Wai Fung: Apparatus and method for providing fluid for immersion lithography. Nikon Corporation, Poon Alex Ka Tim, Kho Leonard Wai Fung, COSTANTINO Mario A, March 17, 2005: WO/2005/024517 (577 worldwide citation)

Embodiments of the present invention are directed to a system and a method of controlling the fluid flow and pressure to provide stable conditions for immersion lithography. A fluid is provided in a space (34) between the lens (22) and the substrate (16) during the immersion lithography process. Flu ...


2
Poon Alex Ka Tim, Kho Leonard Wai Fung: Apparatus and method for providing fluid for immersion lithography. Nikon Corporation, Poon Alex Ka Tim, Kho Leonard Wai Fung, COSTANTINO Mario A, November 24, 2005: WO/2005/111722 (254 worldwide citation)

An apparatus and method are disclosed for providing fluid for immersion lithography. Immersion fluid is injected into an inner cavity (34) in a direction that is different than a direction in which the nozzle (20) moves. The immersion fluid can also be injected at different rates into the inner cavi ...


3
Alex Ka Tim Poon, Leonard Wai Fung Kho: Apparatus and method for providing fluid for immersion lithography. Nikon Corporation, Oliff & Berridge, November 6, 2007: US07292313 (78 worldwide citation)

Systems and methods control the fluid flow and pressure to provide stable conditions for immersion lithography. A fluid is provided in a space between a lens and a substrate during the immersion lithography process. Fluid is supplied to the space and is recovered from the space through a porous memb ...


4

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Alex Ka Tim Poon, Leonard Wai Fung Kho: Apparatus and method for providing fluid for immersion lithography. Nikon Corporation, Oliff & Berridge, August 27, 2013: US08520187 (4 worldwide citation)

A lithographic projection apparatus projects a pattern from a patterning device onto a substrate using a projection system. The apparatus has a liquid supply system to supply a liquid to a space between the projection system and the substrate. The apparatus also has a fluid removal system including ...


6
Alex Ka Tim Poon, Leonard Wai Fung Kho: Apparatus and method for providing fluid for immersion lithography. NIKON CORPORATION, Oliff, January 17, 2017: US09547243 (2 worldwide citation)

An immersion lithography system and method exposes a substrate through a liquid. The substrate is exposed through the liquid, which is provided between a final optical element of a projection lens and the substrate. The liquid is recovered from an upper surface of the substrate via a recovery openin ...


7
Alex Ka Tim Poon, Leonard Wai Fung Kho: Apparatus and method for providing fluid for immersion lithography. Nikon Corporation, Oliff & Berridge, November 8, 2011: US08054448 (2 worldwide citation)

An apparatus and method are disclosed for providing fluid for immersion lithography. Immersion fluid is injected into an inner cavity in a direction that is different than a direction in which the nozzle moves. The immersion fluid can also be injected at different rates into the inner cavity at diff ...


8
Alex Ka Tim Poon, Leonard Wai Fung Kho: Apparatus and method for providing fluid for immersion lithography. Nikon Corporation, Oliff, November 25, 2014: US08896807 (2 worldwide citation)

A liquid immersion lithography apparatus includes a projection system having a final optical element via which a substrate is exposed to an exposure beam through an immersion liquid located between the final optical element and the substrate, and a nozzle member. The nozzle member has a first openin ...


9
Alex Ka Tim Poon, Leonard Wai Fung Kho: Apparatus and method for providing fluid for immersion lithography. NIKON CORPORATION, Oliff, November 14, 2017: US09817319

A liquid immersion lithography apparatus includes a projection system having a final optical element and a nozzle member having a first opening disposed on a first side of the final optical element and from which an immersion liquid is supplied, a second opening disposed on a second side of the fina ...


10
Alex Ka Tim Poon, Leonard Wai Fung Kho: Apparatus and method for providing fluid for immersion lithography. NIKON CORPORATION, Oliff, February 12, 2019: US10203610

A liquid immersion lithography apparatus includes a projection system having a final optical element and a nozzle member having a first opening disposed on a first side of the final optical element and from which an immersion liquid is supplied, a second opening disposed on a second side of the fina ...