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Michael Binnard: Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine. Nikon Corporation, Oliff & Berridge, February 5, 2008: US07327435 (56 worldwide citation)

An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical assembly that projects an image onto a work piece and a stage assembly including a work piece table th ...


2
Michael Binnard: Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine. Nikon Corporation, Oliff & Berridge, June 9, 2009: US07545479 (54 worldwide citation)

A lithographic projection apparatus includes a substrate table configured to hold a substrate, a projection system configured to project a patterned beam onto a target portion of the substrate, liquid being provided to a space between the projection system and the substrate, and a shutter configured ...


3
Michael Binnard: Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine. Nikon Corporation, Oliff & Berridge, July 16, 2013: US08488100 (6 worldwide citation)

An immersion exposure apparatus exposes a substrate with a light beam. The apparatus includes an optical member through which the light beam is irradiated onto the substrate, a substrate table which holds the substrate and is movable relative to the optical member, and a pad member which is movable ...


4
Michael Binnard: Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine. Nikon Corporation, Oliff & Berridge, January 21, 2014: US08634057 (1 worldwide citation)

An immersion exposure apparatus and method exposes a substrate with an exposure beam via an optical element and immersion liquid. A table mounts the substrate. A member is positionable under the optical element. A holding member is arranged to hold the member such that the member is located opposed ...


5
Michael Binnard: Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine. Nikon Corporation, Oliff & Berridge, September 18, 2012: US08269944 (1 worldwide citation)

A liquid immersion exposure apparatus in which a substrate is exposed to an exposure beam, includes an optical member through which the substrate is exposed to the exposure beam, a cover member having a surface, a first holding system that detachably holds the cover member, and a second holding syst ...


6
Michael Binnard: Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine. Nikon Corporation, Oliff, September 30, 2014: US08848168

An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical assembly that projects an image onto a work piece and a stage assembly including a work piece table th ...


7
Michael Binnard: Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine. Nikon Corporation, Oliff, September 30, 2014: US08848166

An immersion exposure apparatus and method expose a substrate with an exposure beam via an optical assembly and via immersion liquid. A first stage on which a substrate is mounted is positioned below the optical assembly so that the immersion liquid is maintained in a space between the optical assem ...


8
Michael Binnard: Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine. NIKON CORPORATION, Oliff, May 3, 2016: US09329493

An immersion exposure apparatus and method exposes a substrate with a light beam via an optical element and immersion liquid. A first stage mounts the substrate and is movable relative to the optical element. A second stage is independently movable relative to the first stage and is positionable awa ...


9
Michael Binnard: Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine. NIKON CORPORATION, Oliff, November 22, 2016: US09500960

An immersion exposure apparatus and method exposes a substrate with a light beam via an optical element and immersion liquid. A table holds the substrate and is movable relative to the optical element. A pad member is movable relative to the table and is movable away from being opposite the optical ...


10
Michael Binnard: Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine. NIKON CORPORATION, Oliff, April 17, 2018: US09946163

An immersion exposure apparatus and method involves (i) supporting a substrate with a stage, (ii) arranging the stage under an optical assembly to maintain immersion liquid in a gap between the optical assembly and the stage, (iii) projecting an image onto the substrate via the optical assembly and ...