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Katherina Babich
Dirk Pfeiffer, Marie Angelopoulos, Katherina Babich, Phillip Brock, Wu Song Huang, Arpan P Mahorowala, David R Medeiros, Ratnam Sooriyakumaran: Antireflective SiO-containing compositions for hardmask layer. International Business Machines Corporation, Steven Capella, May 4, 2004: US06730454 (50 worldwide citation)

Antireflective compositions characterized by the presence of an SiO-containing polymer having chromophore moieties and transparent moieties are useful antireflective hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity prope ...


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Katherina Babich
Dirk Pfeiffer, Marie Angelopoulos, Katherina Babich, Phillip Brock, Wu Song Huang, Arpan P Mahorowala, David R Medeiros, Ratnam Sooriyakumaran: Antireflective SiO-containing compositions for hardmask layer. International Business Machines Corporation, Steven Capella, International Bussiness Machines Corporation, October 23, 2003: US20030198877-A1

Antireflective compositions characterized by the presence of an SiO-containing polymer having chromophore moieties and transparent moieties are useful antireflective hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity prope ...


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Pfeiffer Dirk, Angelopoulos Marie, Babich Katherina, Brock Phillip, Huang Wu Song, Mahorowala Arpan P, Medeiros David R, Sooriyakumaran Ratnam: Antireflective sio-containing compositions for hardmask layer. Ibm, January 12, 2005: EP1495365-A1

Antireflective compositions characterized by the presence of an SiO-containing polymer having chromophore moieties and transparent moieties are useful antireflective hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity prope ...


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Pfeiffer Dirk, Angelopoulos Marie, Babich Katherina, Brock Phillip, Huang Wu Song, Mahorowala Arpan P, Medeiros David R, Sooriyakumaran Ratnam: Antireflective sio-containing compositions for hardmask layer. International Business Machines Corporation, CAPELLA Steven, October 30, 2003: WO/2003/089992

Antireflective compositions characterized by the presence of an SiO-containing polymer having chromophore moieties and transparent moieties are useful antireflective hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity prope ...


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Pfeiffer Dirk, Angelopoulos Marie, Babich Katherina, Brock Phillip, Huang Wu Song, Mahorowala Arpan P, Medeiros David R, Sooriyakumaran Ratnam: Antireflective sio-containing compositions for hardmask layer. Ibm, huang yifen wu xiaonan, July 27, 2005: CN03807642

Antireflective compositions characterized by the presence of an SiO-containing polymer having chromophore moieties and transparent moieties are useful antireflective hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity prope ...


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Pfeiffer Dirk, Angelopoulos Marie, Babich Katherina, Brock Phillip, Huang Wu Song: Antireflective sio-containing compositions for hardmask layer. International Business Machines Corporation, December 21, 2006: TWI268950

Antireflective compositions characterized by the presence of an SiO-containing polymer having chromophore moieties and transparent moieties are useful antireflective hardmask compositions in-lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity prope ...


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Pfeiffer Dirk, Angelopoulos Marie, Babich Katherina, Brock Phillip, Huang Wu Song: Antireflective sio-containing compositions for hardmask layer. International Business Machines Corporation, December 1, 2003: TW200307014

Antireflective compositions characterized by the presence of a SiO-containing polymer having chromophore moieties and transparent moieties are useful antireflective hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity proper ...


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Pfeiffer Dirk, Angelopoulos Marie, Babich Katherina, Brock Phillip, Huang Wu Song, Mahorowala Arpan P, Medeiros David R, Sooriyakumaran Ratnam: Antireflective sio-containing compositions for hardmask layer. International Business Machines Corporation, November 26, 2004: KR1020047014412

Antireflective compositions characterized by the presence of an SiO- containing polymer having chromophore moieties and transparent moieties are useful antireflective hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity prop ...


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