1
Hirukawa Shigeru, Magome Nobutaka, Tanaka Issey: (Ja) 露光装置及びデバイス製造方法, (En) Exposure system and device producing method. Nikon Corporation, Hirukawa Shigeru, Magome Nobutaka, Tanaka Issey, TATEISHI Atsuji, June 24, 2004: WO/2004/053955 (703 worldwide citation)

(EN) Liquid is supplied by a supply mechanism (72) to between a lens (42) and a wafer (W) on a stage via a supply port (36) on one side of the lens (42), and the liquid is recovered by the recovering mechanism (74) via a recovery tube (52) on the other side of the lens (42). When the supply and the ...


2
Nei Masahiro, Kobayashi Naoyuki, Arai Dai, Owa Soichi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Nei Masahiro, Kobayashi Naoyuki, Arai Dai, Owa Soichi, KAWAKITA Kijuro, June 24, 2004: WO/2004/053953 (526 worldwide citation)

(EN) An exposure apparatus, wherein an exposure of a substrate (P) is carried out by locally filling the image plane side of a projection optical system (PL) with a liquid (50) and projecting an image of a pattern onto the substrate (P) through the projection optical system (PL) and the liquid (50), ...


3
Mizutani Hideo, Magome Nobutaka: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Mizutani Hideo, Magome Nobutaka, KAWAKITA Kijuro, June 24, 2004: WO/2004/053958 (504 worldwide citation)

(EN) An exposure apparatus, wherein an exposure of a substrate (P) is carried out by filling at least a portion of the space between a projection optical system and the substrate (P) with a liquid and projecting an image of a pattern onto the substrate (P) through the projection optical system and t ...


4
Magome Nobutaka, Takaiwa Hiroaki, Arai Dai: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Magome Nobutaka, Takaiwa Hiroaki, Arai Dai, KAWAKITA Kijuro, June 24, 2004: WO/2004/053952 (501 worldwide citation)

(EN) An exposure apparatus, wherein an exposure is carried out while filling a space between a projection optical system and a substrate with a liquid, enables to suppress deterioration of a device caused by adherent liquid on the substrate. A device manufacturing system (SYS) comprises an exposure ...


5
Nei Masahiro, Kobayashi Naoyuki, Chiba Hiroshi, Hirukawa Shigeru: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Nei Masahiro, Kobayashi Naoyuki, Chiba Hiroshi, Hirukawa Shigeru, KAWAKITA Kijuro, June 24, 2004: WO/2004/053954 (469 worldwide citation)

(EN) An exposure apparatus (EX) carries out an exposure of a substrate (P) by filling the space between a projection optical system (PL) and the substrate (P) with a liquid (50) and projecting an image of a pattern onto the substrate (P) through the liquid (50) using the projection optical system (P ...


6
Owa Soichi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Owa Soichi, KAWAKITA Kijuro, June 24, 2004: WO/2004/053950 (462 worldwide citation)

(EN) An exposure apparatus, wherein exposure is carried out while filling a space between a projection optical system and a substrate with a liquid, enables to suppress deterioration of a pattern image caused by air bubbles in the liquid. The exposure apparatus comprises a liquid supply unite (1) fo ...


7
Kobayashi Naoyuki, Tanimoto Akikazu, Mizuno Yasushi, Shiraishi Kenichi, Nakano Katsushi, Owa Soichi: (Ja) 露光装置及びデバイス製造方法, (En) Exposure device and device manufacturing method. Nikon Corporation, Kobayashi Naoyuki, Tanimoto Akikazu, Mizuno Yasushi, Shiraishi Kenichi, Nakano Katsushi, Owa Soichi, KAWAKITA Kijuro, December 2, 2004: WO/2004/105107 (257 worldwide citation)

(EN) There is provided an exposure device capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and liquid. The exposure device projects a pattern image onto the substrate (P) v ...


8
Ebihara Akimitsu: (Ja) 露光装置及びデバイス製造方法, (En) Exposure device and device producing method. Nikon Corporation, Ebihara Akimitsu, TATEISHI Atsuji, December 29, 2004: WO/2004/114380 (185 worldwide citation)

(EN) A wafer (W) and a table (TB) having the wafer (W) placed thereon are held between a water pressure pad (32) and a water pressure pad (34). The distance in the direction of the optical axis of a projection optics system (PL) between a bearing surface and the wafer (W) is maintained at a predeter ...


9
Hara Hideaki: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and method for manufacturing device. Nikon Corporation, Hara Hideaki, SHIGA Masatake, October 21, 2004: WO/2004/090956 (166 worldwide citation)

(EN) An exposure apparatus (EX) is disclosed wherein an image of a pattern is projected onto a substrate (P) via a projection optical system (PL) and the substrate (P) is exposed to light. The exposure apparatus (EX) comprises a movable substrate stage (PST) for holding the substrate (P) above the p ...


10
Nagasaka Hiroyuki, Yamamoto Taro, Hirakawa Osamu: (Ja) 露光装置及びデバイス製造方法, (En) Exposure apparatus and device producing method. Nikon Corporation, Tokyo Electron, Nagasaka Hiroyuki, Yamamoto Taro, Hirakawa Osamu, SHIGA Masatake, March 31, 2005: WO/2005/029559 (148 worldwide citation)

(EN) An exposure apparatus for exposing a substrate by projecting an image of a pattern onto a substrate through a projection optical system and a liquid. The exposure apparatus has a liquid supply mechanism and a liquid recovery mechanism. The liquid supply mechanism supplies a liquid onto a substr ...