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Nagasaka Hiroyuki, Owa Soichi, Nishii Yasufumi: (Ja) 露光装置、露光方法及びデバイス製造方法, (En) Exposure apparatus and method, and method of producing apparatus. Nikon Corporation, Nagasaka Hiroyuki, Owa Soichi, Nishii Yasufumi, KAWAKITA Kijuro, October 7, 2004: WO/2004/086468 (208 worldwide citation)

(EN) An exposure apparatus (EX) exposes a substrate (P) by projecting an image of a predetermined pattern on the substrate through a liquid (1). The exposure apparatus has a projection optical system for the projection and a liquid-feeding mechanism (10) for feeding a liquid on to the substrate to f ...


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Nagasaka Hiroyuki: (Ja) 露光装置、露光方法及びデバイス製造方法, (En) Exposure apparatus, exposure method, and device producing method. Nikon Corporation, Nagasaka Hiroyuki, KAWAKITA Kijuro, July 21, 2005: WO/2005/067013 (83 worldwide citation)

(EN) An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) through a liquid (LQ) supplied from a liquid supply mechanism (10) and through a projection optical system (PL). The exposure apparatus (EX) has a pressure regulation mechanism (90) for re ...


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Nagasaka Hiroyuki: (Ja) 露光装置、露光方法及びデバイス製造方法, (En) Exposure device, exposure method, and device manufacturing method. Nikon Corporation, Nagasaka Hiroyuki, KAWAKITA Kijuro, April 20, 2006: WO/2006/041086 (34 worldwide citation)

(EN) An exposure device (EX) fills an optical path space of the image surface side of a projection optical system (PL) with liquid (LQ) and exposes a substrate (P) via the projection optical system (PL) and the liquid (LQ). The exposure device (EX) has a measurement device (30) for measuring an opti ...


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Nagasaka Hiroyuki, Okuyama Takeshi: (Ja) 露光装置、露光方法及びデバイス製造方法, (En) Exposure equipment, exposure method and device manufacturing method. Nikon Corporation, Nikon Engineering, Nagasaka Hiroyuki, Okuyama Takeshi, KAWAKITA Kijuro, December 22, 2005: WO/2005/122221 (25 worldwide citation)

(EN) Exposure equipment (EX) exposes a board (P) by irradiating the board (P) with exposure light (EL) through a projection optical system (PL) and a liquid (LQ). The exposure equipment (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ ...


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Arai Masayoshi: (Ja) 露光装置、露光方法及びデバイス製造方法、並びにシステム, (En) Exposure apparatus, exposure method, device manufacturing method, and system. Nikon Corporation, Arai Masayoshi, TATEISHI Atsuji, January 11, 2007: WO/2007/004567 (19 worldwide citation)

(EN) An exposure apparatus (10) is provided with a laser apparatus (16) for emitting a laser beam; a memory (51) wherein first information indicating a relationship between a line width error of a pattern formed on a wafer and laser spectral characteristics of the laser beam emitted from the laser a ...


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Kobayashi Naoyuki, Owa Soichi, Hirukawa Shigeru, Omura Yasuhiro: (Ja) 露光装置、露光方法及びデバイス製造方法, (En) Exposure apparatus, exposure method, and device producing method. Nikon Corporation, Kobayashi Naoyuki, Owa Soichi, Hirukawa Shigeru, Omura Yasuhiro, KAWAKITA Kijuro, August 18, 2005: WO/2005/076324 (18 worldwide citation)

(EN) An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) through liquid (LQ). The exposure apparatus (EX) has a substrate holder (PH) for holding the substrate (P), a substrate stage (PST) capable of moving the substrate (P) held by the substrat ...


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Nishii Yasufumi: (Ja) 露光装置、露光方法及びデバイス製造方法, (En) Exposure apparatus, exposure method, and device producing method. Nikon Corporation, Nishii Yasufumi, KAWAKITA Kijuro, December 15, 2005: WO/2005/119742 (15 worldwide citation)

(EN) An exposure apparatus has a projection optical system with optical elements. Liquid (LQ1) is placed in a first space (K1) on the lower surface (2S) side of an optical element (2G) closest to an image surface of the projection optical system, and liquid (LQ2) is placed in a second space (K2), in ...


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Nagasaka Hiroyuki, Ishii Yuuki, Makinouchi Susumu: (Ja) 露光装置、露光方法及びデバイス製造方法, (En) Exposure apparatus, exposure method, and device producing method. Nikon Corporation, Nagasaka Hiroyuki, Ishii Yuuki, Makinouchi Susumu, SHIGA Masatake, March 3, 2005: WO/2005/020299 (15 worldwide citation)

(EN) An exposure apparatus exposes a substrate by irradiating exposure light on the substrate placed on the image surface side of a projection optical system, the irradiation being performed through a projection optical system and a liquid. The exposure apparatus has a liquid feeding mechanism for f ...


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Magome Nobutaka, Mizutani Hideo, Hidaka Yasuhiro: (Ja) 露光装置、露光方法及びデバイス製造方法、並びに面形状検出装置, (En) Exposure apparatus, exposure method, device manufacturing method, and surface shape detecting device. Nikon Corporation, Magome Nobutaka, Mizutani Hideo, Hidaka Yasuhiro, TATEISHI Atsuji, October 13, 2005: WO/2005/096354 (12 worldwide citation)

(EN) At subroutine 201 and at step 205, the best focus plane of a projection optical system (PL) and the offset component of a multipoint AF system are detected as calibration information. During measurement of an alignment mark by means of an alignment system (ALG) at step 215, information (Z map) ...


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Nagasaka Hiroyuki, Takaiwa Hiroaki, Hirukawa Shigeru, Hoshika Ryuichi, Ishizawa Hitoshi: (Ja) 露光装置、露光方法及びデバイス製造方法、並びに光学部品, (En) Exposure apparatus, exposure method, device producing method, and optical component. Nikon Corporation, Nagasaka Hiroyuki, Takaiwa Hiroaki, Hirukawa Shigeru, Hoshika Ryuichi, Ishizawa Hitoshi, KAWAKITA Kijuro, June 16, 2005: WO/2005/055296 (10 worldwide citation)

(EN) An exposure apparatus (EX) is an apparatus for exposing a substrate (P) by irradiating exposure light (EL) onto the substrate (P) through a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P). A plate member (30) ...