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Nagasaka Hiroyuki, Okuyama Takeshi: (Ja) 露光装置、露光方法及びデバイス製造方法, (En) Exposure equipment, exposure method and device manufacturing method. Nikon Corporation, Nikon Engineering, Nagasaka Hiroyuki, Okuyama Takeshi, KAWAKITA Kijuro, December 22, 2005: WO/2005/122221 (25 worldwide citation)

(EN) Exposure equipment (EX) exposes a board (P) by irradiating the board (P) with exposure light (EL) through a projection optical system (PL) and a liquid (LQ). The exposure equipment (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ ...


2
Owa Soichi, Nagasaka Hiroyuki, Sugawara Ryu: (Ja) 露光装置、露光方法及びデバイス製造方法, (En) Exposure equipment, exposure method and device manufacturing method. Nikon Corporation, Owa Soichi, Nagasaka Hiroyuki, Sugawara Ryu, KAWAKITA Kijuro, February 9, 2006: WO/2006/013806 (7 worldwide citation)

(EN) Exposure equipment (EX) is provided with a projection optical system (PL), and the projection optical system (PL) has a first optical element (LS1) which is closest to an image surface of the projection optical system (PL). The exposure equipment (EX) is provided with a first liquid immersion m ...


3
Shibazaki Yuichi: (Ja) 露光装置及び露光方法、並びにデバイス製造方法, (En) Exposure equipment, exposure method and device manufacturing method. Nikon Corporation, Shibazaki Yuichi, TATEISHI Atsuji, October 6, 2005: WO/2005/093792 (5 worldwide citation)

(EN) A measuring stage (MST) is provided with a plate (101) for supplying a liquid and performs measurement relating to exposure through a projection optical system (PL) and the liquid (Lq). In the measuring stage, at least a part of it, including the plate, is replaceable. Therefore, measurement re ...