1
Ravi Laxman
Ravi K Laxman, Arthur K Hochberg, David A Roberts, Raymond N Vrtis: Fluorine doped silicon oxide process. Air Products and Chemicals, Geoffrey L Chase, February 20, 1996: US05492736 (25 worldwide citation)

The present invention is a process for forming a fluorine-containing silicon oxide film on a substrate by plasma-enhanced chemical vapor deposition using a fluorinated silicon source of the formula: ##STR1## wherein at least one of R.sup.1 -R.sup.6 is fluorine and the remaining R groups are independ ...


2
Jean-luc Dubois
Jean Luc Dubois, Markus Brandhorst, Daniel Bianchi, Frederic Thevenet: Method for producing hydrogen peroxide. Arkema France, Centre National de la Recherche Scientifique, Universite Claude Bernard Lyon 1, Steven D Boyd, February 17, 2015: US08956508

The present invention relates to a method for preparing an aqueous solution of hydrogen peroxide from oxygen, hydrogen and optionally water. The invention more particularly relates to a method for preparing an aqueous solution of hydrogen peroxide in which at least a portion of the reactor is cooled ...


3
Jean-Michel Geets
LAMBERT Bernard, GEETS Jean Michel, CAMBRIANI Andrea, DEGEYTER Michel, KISELEV Maxim: DISPOSITIF DESTINÉ À LA PRODUCTION DE RADIOISOTOPES, DEVICE FOR PRODUCING RADIOISOTOPES. ION BEAM APPLICATIONS, LAMBERT Bernard, GEETS Jean Michel, CAMBRIANI Andrea, DEGEYTER Michel, KISELEV Maxim, PRONOVEM OFFICE VAN MALDEREN, May 3, 2012: WO/2012/055970

The invention relates to a device (1) for producing radioisotopes by irradiating a target fluid using a particle beam (13). This device comprises an irradiation cell (7) that includes a cavity (3) for receiving the target fluid. A non-cryogenic cooling device cools the walls of the cavity (3). The c ...


4
Jean-Michel Geets
LAMBERT Bernard, GEETS Jean michel, COMOR Jozef J, JOVANOVIC Djuro: Appareil de production dun radioisotope comprenant un moyen de maintenance, ainsi que procédé de maintenance dudit appareil, Apparatus for producing a radioisotope comprising means for maintenance and method of maintenance for said apparatus. Ion Beam Applications, LAMBERT Bernard, GEETS Jean michel, COMOR Jozef J, JOVANOVIC Djuro, Pronovem Office Van Malderen, December 8, 2011: WO/2011/151316

The present invention relates to an apparatus for producing a radioisotope by irradiating a target fluid comprising a precursor of said radioisotope with a particle beam produced by a particle accelerator, the apparatus comprising: -a housing comprising a target cavity for receiving said target flui ...


5
Katherina Babich
Noriaki Fukiage, Katherina Babich: Method of improving post-develop photoresist profile on a deposited dielectric film. Tokyo Electron, International Business Machines Corporation, November 3, 2009: US07611758

A method and apparatus for improving the post-development photoresist profile on a deposited dielectric film. The method includes depositing a TERA film having tunable optical and etch resistant properties on a substrate using a plasma-enhanced chemical vapor deposition process and post processing t ...


6
Ravi Laxman
John N Gregg, Scott L Battle, Jeffrey I Banton, Donn K Naito, Ravi K Laxman: Method and apparatus to help promote contact of gas with vaporized material. Advanced Technology Materials, Intellectual Property Technology Law, March 6, 2008: US20080057218-A1

Vaporizable material is supported within a vessel to promote contact of an introduced gas with the vaporizable material, and produce a product gas including vaporized material. A heating element supplies heat to a wall of the vessel to heat vaporizable material disposed therein. The vessel may compr ...


7
Katherina Babich
Noriaki Fukiage, Katherina Babich: Method for depositing materials on a substrate. Tokyo Electron, International Business Machines Corporation, Pillsbury Winthrop, May 12, 2005: US20050100682-A1

A method and apparatus for depositing a TERA film having tunable optical and etch resistant properties on a substrate using a plasma-enhanced chemical vapor deposition process, wherein for at least a part of the deposition of the TERA film, the plasma-enhanced chemical vapor deposition process emplo ...


8
Katherina Babich
Noriaki Fukiage, Katherina Babich: Method of improving post-develop photoresist profile on a deposited dielectric film. Tokyo Electron, International Business Machines Corporation, Pillsbury Winthrop, May 12, 2005: US20050100683-A1

A method and apparatus for improving the post-development photoresist profile on a deposited dielectric film. The method includes depositing a TERA film having tunable optical and etch resistant properties on a substrate using a plasma-enhanced chemical vapor deposition process and post processing t ...


9
Ed Rutter
Edward W Rutter: Stripper. Rohm and Haas Electronic Materials, S Matthew Cairns, c o EDWARDS & ANGELL, November 4, 2004: US20040220066-A1

Compositions suitable for removing polymeric material, particularly post-plasma etch polymeric material, from a substrate are provided. These compositions contain one or more quaternary ammonium silicates as the active component. Methods of removing polymeric material using these compositions are al ...


10
Katherina Babich
Marie Angelopoulos, Katherina E Babich, Cameron James Brooks, S Jay Chey, C Richard Guarnieri, Michael Straight Hibbs, Kenneth Christopher Racette: Attenuated embedded phase shift photomask blanks. Dr Daniel P Morris Esq, IBM Corporation, March 18, 2004: US20040053026-A1

An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen or metal, silicon, nitrogen and oxygen. A wide range of optical transmission (0.001% up to 20% at 193 nm) is obtained ...



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