Katuichi Kawabata, Kuniaki Nakano: Method for preparation of radiographic image conversion panel and radiographic image conversion panel thereby. Konica Corporation, Finnegan Henderson Farabow Garrett and Dunner, August 7, 1990: US04947046 (93 worldwide citation)

A method for preparing a radiographic image conversion panel and the panel prepared thereby is disclosed. In the method a vapor flow of photostimulable phosphor or its raw material is applied to a support at a particular angle of incidence with respect to the normal direction of the support.

Peter Rothschild, Lee Grodzins: Chopper wheel with two axes of rotation. American Science and Engineering, Bromberg & Sunstein, August 13, 2002: US06434219 (90 worldwide citation)

An apparatus and method for creating a beam of penetrating radiation of specified cross section that raster scans over a two-dimensional area, using a chopper wheel rotated about two axes. The wheel has a set of apertures of which at least one is illuminated to form the beam. Rotary actuators rotate ...

Yusuke Fujii, Hisataka Fujimaki, Kazuo Hiramoto: Charged particle irradiation system. Hitachi, Mattingly & Malur P C, November 23, 2010: US07838855 (89 worldwide citation)

A charged particle irradiation system that positions the beam at a target position to avoid irradiation of normal tissue includes an acceleration system 6 for extracting a charged particle beam, scanning magnets 24 and 25, and charged particle beam position monitors 26 and 27. On the basis of signal ...

Martin Hartick, Frank Cordes: Apparatus and method for adjusting a collimator. Heimann Systems, Birch Stewart Kolasch & Birch, November 19, 2002: US06483894 (89 worldwide citation)

A collimator for an X-ray testing machine and a method for adjusting the collimator with the aid of a detection system disposed in the collimator that includes at least two spatially separate detection devices, disposed and spacing one behind the other.

Tanya E Jewell, Kevin Thompson: Ringfield lithography. AT&T Bell Laboratories, George S Indig, May 24, 1994: US05315629 (89 worldwide citation)

Ringfield projection apparatus using x-ray radiation e.g. of 1.30 .ANG. wavelength is suitable for lithographic patterning in the fabrication of integrated circuits at design rules of 0.25 .mu.m and below. The design permits reduction from an enlarged mask as well as substantial throughput, the latt ...

Avery Robert F: Support structure for electron accelerator with deflecting means and target and cooperating patient support. Varian Associates, June 1, 1971: US3582650 (88 worldwide citation)

Improved linear accelerator apparatus for directing ionizing radiation on an object is realized by utilization of a horizontal axis of rotation about which the linear accelerator axis rotates while the accelerator axis maintains a horizontal spatial orientation at different circumferential points of ...

Otto Pastyr, Wolfgang Maier Borst: Contour collimator for radiation therapy. Siemens Aktiengesellschaft, Hill Van Santen Steadman & Simpson, December 27, 1988: US04794629 (87 worldwide citation)

A contour collimator has diaphragm plates arranged in displaceable fashion relative to one another. Each diaphragm plate is individually engageable with an adjustment element shared by all of the diaphragm plates for displacing one diaphragm plate relative to the remaining diaphragm plates. An inter ...


Scott W Barton, Peter M Calandra: Angle dispersive x-ray spectrometer. Molecular Metrology, Choate Hall & Stewart, July 13, 1999: US05923720 (86 worldwide citation)

An x-ray spectrometer is provided comprising an X-ray source, a curved crystal monochromator which focuses a monochromatic x-ray beam onto a sample surface, the curved crystal monochromator comprising a shape which is substantially identical to a logarithmic spiral, and a position-sensitive x-ray de ...

Jörg Schultz, Johannes Wangler, Karl Heinz Schuster, Udo Dinger: Illumination system particularly for EUV lithography. Carl Zeiss Stiftung Trading Carl Zeiss, Ohlandt Greeley Ruggiero & Perle L, March 6, 2001: US06198793 (85 worldwide citation)

The invention concerns an illumination system for wavelengths ≦193 nm, particularly for EUV lithography, with at least one light source, which has an illumination A in a predetermined surface; at least one device for producing secondary light sources; at least one mirror or lens device comprising ...

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