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Eb Eshun
Ebenezer E Eshun, Steven H Voldman: High tolerance TCR balanced high current resistor for RF CMOS and RF SiGe BiCMOS applications and cadenced based hierarchical parameterized cell design kit with tunable TCR and ESD resistor ballasting feature. International Business Machines Corporation, Scully Scott Murphy & Presser P C, Anthony J Canale, May 24, 2011: US07949983 (2 worldwide citation)

A resistor device structure and method of manufacture therefore, wherein the resistor device structure invention includes a plurality of alternating conductive film and insulative film layers, at least two of the conductive film layers being electrically connected in parallel to provide for high cur ...


2
Eb Eshun
Timothy Dalton, Ebenezer E Eshun, Sarah L Grunow, Zhong Xiang He, Anthony K Stamper: Interconnect structures and design structures for a radiofrequency integrated circuit. International Business Machines Corporation, November 22, 2012: US20120292741-A1

Interconnect structures that include a passive element, such as a thin film resistor or a metal-insulator-metal (MIM) capacitor, methods for fabricating an interconnect structure that includes a passive element, and design structures embodied in a machine readable medium for designing, manufacturing ...


3
James Kraemer Ph.D.
Robert R Friedlander, Thomas L Hanks, Richard Hennessy, James R Kraemer: Automated derivation, design and execution of industry-specific information environment. International Business Machines Corporation, May 5, 2011: US20110106516-A1

A computer-implemented method, system and program product for creating a physical information environment for a specific industry type are presented. A candidate industry type is selected to describe a customer's operations. A set of information environment components, which is modeled and simulated ...


4
William H. Gates III
Raymond E Ozzie, William H Gates III, Gary W Flake, Thomas F Bergstraesser, Arnold N Blinn, Christopher W Brumme, Lili Cheng, Michael Connolly, Nishant V Dani, Dane A Glasgow, Daniel S Glasser, Alexander G Gounares, James R Larus, Matthew B MacLaurin, Henricus Johannes Maria Meijer, Debi P Mishra, Amit Mital, Ira L Snyder Jr, Chandramohan A Thekkath, David R Treadwell III, Melora Zaner Godsey: Personal data mining. Microsoft Corporation, Hope Baldauff Hartman, April 19, 2011: US07930197 (105 worldwide citation)

Personal data mining mechanisms and methods are employed to identify relevant information that otherwise would likely remain undiscovered. Users supply personal data that can be analyzed in conjunction with data associated with a plurality of other users to provide useful information that can improv ...


5
sally liu
Hsiao Tsung Yen, Tzu Jin Yeh, Sally Liu: Method and apparatus for de-embedding on-wafer devices. Taiwan Semiconductor Manufacturing Company, Haynes and Boone, May 31, 2011: US07954080 (8 worldwide citation)

A method and system for de-embedding an on-wafer device is disclosed. The method comprises representing the intrinsic characteristics of a test structure using a set of ABCD matrix components; determining the intrinsic characteristics arising from the test structure; and using the determined intrins ...


6
sally liu
Tzu Jin Yeh, Kal Wen Tan, Chewn Pu Jou, Sally Liu, Fu Lung Hsueh: Method for substrate noise analysis. Taiwan Semiconductor Manufacturing Company, Slater & Matsil L, January 7, 2014: US08627253 (1 worldwide citation)

In accordance with an embodiment, a method for substrate noise analysis comprises using a first processor based system, creating and simulating a circuit schematic comprising a multi-terminal model of a transistor, and thereafter, creating a layout based on properties represented in the circuit sche ...


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8
Fang Cheng Chang, Yao Ting Wang, Yagyensh C Pati: Design rule checking system and method. Numerical Technologies, Mark A Haynes, Haynes Beffel & Wolfeld, October 22, 2002: US06470489 (350 worldwide citation)

A method for performing design rule checking on OPC corrected or otherwise corrected designs is described. This method comprises accessing a corrected design and generating a simulated image. The simulated image corresponds to a simulation of an image which would be printed on a wafer if the wafer w ...


9
Philip J Kuekes, R Stanley Williams: Demultiplexer for a molecular wire crossbar network (MWCN DEMUX). Hewlett Packard Company, July 3, 2001: US06256767 (348 worldwide citation)

A demultiplexer for a two-dimensional array of a plurality of nanometer-scale switches (molecular wire crossbar network) is disclosed. Each switch comprises a pair of crossed wires which form a junction where one wire crosses another and at least one connector species connecting said pair of crossed ...


10
Athanassios Katsioulas, Stan Chow, Jacob Avidan, Dimitris Fotakis: Standard block architecture for integrated circuit design. Ammocore Technologies, Anthony T Cascio, March 18, 2003: US06536028 (305 worldwide citation)

A STANDARD BLOCK architecture for integrated circuit (IC) design. The STANDARD BLOCK architecture provides a new level of abstraction with a granularity and regularity that is most appropriate for the physical implementation of complex, large scale deep-submicron IC designs. To this end, the STANDAR ...