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Maricela Morales Charles Szmanda
Charles R Szmanda, George G Barclay, Peter Trefonas, Wang Yueh: Polymer and photoresist compositions. Shipley Company, S Matthew Cairns, c o EDWARDS & ANGELL, October 31, 2002: US20020160302-A1 (1 worldwide citation)

Disclosed are spirocyclic olefin polymers, methods of preparing spirocyclic olefin polymers, photoresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.


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Maricela Morales Charles Szmanda
Charles R Szmanda, George G Barclay, Peter Trefonas, Wang Yueh: Polymer and photoresist compositions. Shipley Company, Dike Bronstein Roberts & Cushman IP Group, c o EDWARDS & ANGELL, October 24, 2002: US20020155380-A1

Disclosed are spirocyclic olefin ploymers, methods of preparing spirocyclic olefin polymers, photoresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.


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Maricela Morales Charles Szmanda
Peter Trefonas, Gary N Taylor, Charles R Szmanda: Novel polymers and photoresist compositions for short wavelength imaging. Shipley Company, Peter F Corless, Edwards & Angell, May 2, 2002: US20020051938-A1

This invention relates to resins and photoresist compositions that comprise such resins. Preferred polymers of the invention comprise adjacent saturated carbon atoms, either integral or pendant to the polymer backbone, that have a substantially gauche conformation. Polymers of the invention are part ...


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Katherina Babich
Marie Angelopoulos, Katherina Babich, Alfred Grill, Scott David Halle, Arpan Pravin Mahorowala, Vishnubhai Vitthalbhai Patel: Tunable vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and applications thereof. International Business Machines Corporation, Daniel P Morris, February 4, 2003: US06514667 (53 worldwide citation)

A lithographic structure and method of fabrication and use thereof having a plurality of layers at least one of which is a an RCHX layer which comprises a material having structural formula R:C:H:X, wherein R is selected from the group consisting of Si, Ge, B, Sn, Fe, Ti and combinations thereof and ...


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Katherina Babich
Dirk Pfeiffer, Marie Angelopoulos, Katherina Babich, Phillip Brock, Wu Song Huang, Arpan P Mahorowala, David R Medeiros, Ratnam Sooriyakumaran: Antireflective SiO-containing compositions for hardmask layer. International Business Machines Corporation, Steven Capella, May 4, 2004: US06730454 (47 worldwide citation)

Antireflective compositions characterized by the presence of an SiO-containing polymer having chromophore moieties and transparent moieties are useful antireflective hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity prope ...


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Brian Goodall
Brian L Goodall, Saikumar Jayaraman, Robert A Shick, Larry F Rhodes: Photoresist compositions comprising polycyclic polymers with acid labile pendant groups. Sumitomo Bakelite, Hudak Shunk & Farine Co, September 14, 2004: US06790579 (46 worldwide citation)

The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cl ...


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Charles Szmanda
Gary N Taylor, Charles R Szmanda: Polymers and photoresist compositions. Shipley Company L L C, Darryl P Frickey, Peter F Corless, May 2, 2000: US06057083 (41 worldwide citation)

The present invention provides novel polymers and chemically-amplified positive-acting photoresist compositions that contain such polymers as a resin binder component. Preferred polymers of the invention include one or more structural groups that are capable of reducing the temperature required for ...


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Brian Goodall
Brian L Goodall, Saikumar Jayaraman, Robert A Shick, Larry F Rhodes, Robert David Allen, Richard Anthony DiPietro, Thomas Wallow: Photoresist compositions comprising polycyclic polymers with acid labile pendant groups. Sumitomo Bakelite, International Business Machines, Thoburn T Dunlap, Hudak Shunk & Farine Co A, April 20, 2004: US06723486 (23 worldwide citation)

The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cl ...


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Charles Szmanda
Charles R Szmanda, George G Barclay, Peter Trefonas III, Wang Yueh: Polymer and photoresist compositions. Shipley Company L L C, S Matthew Cairns, June 18, 2002: US06406828 (19 worldwide citation)

Disclosed are polymers including as polymerized units one or more spirocyclic olefin monomer of the formulae I or Ia



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