1
Erwin Meinders
Meinders Erwin Rinaldo, Giesen Peter Theodorus Maria: Scanned writing of an exposure pattern on a substrate. Tno, January 21, 2009: EP2017833-A1 (1 worldwide citation)

An exposure pattern is written on a substrate, by scanning a light spot along a trajectory over the substrate and switching it on and off according to a desired pattern. Respective spot sizes of the light for illuminating the substrate in respective parts of the trajectory according to a geometry of ...


2
Young Bae
Young Cheol BAE, Matthew M Meyer, Jibin Sun, Seung Hyun Lee, Jong Keun Park: Polymers, photoresist compositions and methods of forming photolithographic patterns. Dow Global Technologies, Rohm and Haas Electronic Materials, November 15, 2012: US20120288794-A1

Provided are polymers containing a unit having a particular acetal moiety and photoresist compositions containing such a polymer. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The polymers, photoresist compositions, methods a ...


3
Young Bae
Young Cheol BAE, Rosemary BELL, Thomas CARDOLACCIA, Seung Hyun LEE, Yi LIU, Jong Keun PARK: Photoresist compositions and methods of forming photolithographic patterns. Rohm and Haas Electronic Materials, August 30, 2012: US20120219901-A1

Provided are photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufactur ...


4
Young Bae
Young Cheol BAE, Thomas Cardolaccia, Jibin Sun, Daniel J Arriola, Kevin A Frazier: Photoresist compositions and methods of forming photolithographic patterns. Dow Global Technologies, Rohm and Haas Electronic Materials, March 15, 2012: US20120064456-A1

Provided are photoresist compositions useful in forming photolithographic patterns by a negative tone development process. Also provided are methods of forming photolithographic patterns by a negative tone development process and substrates coated with the photoresist compositions. The compositions, ...


5
Young Bae
Young Cheol BAE, Thomas CARDOLACCIA, Yi LIU: Photoacid generators and photoresists comprising same. Rohm and Haas Electronic Materials, November 24, 2011: US20110287361-A1

New photoacid generator compounds are provided that comprise a nitrogen-base functional component of the structure —C(═O)N<. Photoresist compositions also are provided that comprise one or more PAGs of the invention.


6
Young Bae
Young Cheol BAE, Thomas Cardolaccia, Yi Liu: Methods of forming electronic devices. Rohm and Haas Electronic Materials, May 19, 2011: US20110117490-A1

Methods of forming electronic devices are provided. The methods involve alkaline treatment of photoresist patterns and allow for the formation of high density resist patterns. The methods find particular applicability in semiconductor device manufacture.


7
John Amara
John P Amara, James F Cameron, Jin Wuk Sung, Gregory P Prokopowicz: Coating compositions suitable for use with an overcoated photoresist. Rohm and Haas Electronic Materials, Peter F Corless, Rohm and Haas Electronic Materials, January 6, 2011: US20110003250-A1

In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a ...


8
Young Bae
Young Cheol BAE, Thomas Cardolaccia, Yi Liu: Methods of forming electronic devices. Rohm and Haas Electronic Materials, Jonathan D Baskin, Rohm and Haas Electronic Materials, December 30, 2010: US20100330503-A1

Methods of forming electronic devices are provided. The methods involve alkaline treatment of photoresist patterns and allow for the formation of high density resist patterns. The methods find particular applicability in semiconductor device manufacture.


9
Young Bae
Young Cheol Bae, Thomas Cardolaccia, Yi Liu: Self-aligned spacer multiple patterning methods. Rohm and Haas Electronics Materials, Jonathan D Baskin, Rohm and Haas Electronic Materials, December 30, 2010: US20100330498-A1

Self-aligned spacer multiple patterning method are provided. The methods involve alkaline treatment of photoresist patterns and allow for the formation of high density resist patterns. The methods find particular applicability in semiconductor device manufacture.


10
Young Bae
Young Cheol BAE, Thomas Cardolaccia, Yi Liu: Methods of forming electronic devices. Rohm and Haas Electronic Materials, Jonathan D Baskin, Rohm and Haas Electronic Materials, December 30, 2010: US20100330500-A1

Methods of forming electronic devices are provided. The methods involve alkaline treatment of photoresist patterns and allow for the formation of high density resist patterns. The methods find particular applicability in semiconductor device manufacture.