1
Fred Thomas Fred Thomas
Thomas Fred C Iii, Dixon Glenn B, Shelton Todd R, Graves Todd L, Bracken Allen T: Latent illuminance discrimination marker and system for data storage cartridges. Iomega, July 12, 2000: EP1018090-A1

An object (20) or an article, such as a data storage cartridge, for a detector or reader, such as a data storage disk drive, has a latent illuminance marker. A light source (34) illuminates the marker and the marker emits illuminance as phosphorescence. A photosensor (36) detects the emitted illumin ...


2
Maricela Morales Charles Szmanda
Charles R Szmanda, George G Barclay, Peter Trefonas, Wang Yueh: Polymer and photoresist compositions. S Matthew Cairns, Rohm and Haas Electronic Materials, August 4, 2005: US20050170278-A1

Disclosed are spirocyclic olefin polymers, methods of preparing spirocyclic olefin polymers, photresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.


3
Garo Khanarian
Larry F Charbonneau, Robert E Johnson, Helmut B Witteler, Garo Khanarian: Isosorbide containing polyesters and methods for making same. HNA Holdings, Burns Doane Swecker & Mathis L, May 16, 2000: US06063464 (100 worldwide citation)

A polyester polymer and method for making the polyester, wherein the polyester is prepared by (1) combining in a reactor a monomer containing a diacid moiety; a monomer comprising a diol moiety; and a monomer containing an isosorbide moiety; with a condensation catalyst suitable for condensing aroma ...


4
Charles Szmanda
James W Thackeray, Gerald B Wayton, Charles R Szmanda: Coating compositions for use with an overcoated photoresist. Rohm and Haas Electronic Materials, Peter F Corless, Darryl P Frickey, Edwards Angell Palmer & Dodge, September 8, 2009: US07585612 (21 worldwide citation)

Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive followi ...


5
Katherina Babich
Marie Angelopoulos, Katherina E Babich, David R Medeiros, Wayne M Moreau: Multifunctional polymeric materials and use thereof. International Business Machines Corporation, Daniel P Morris, Connolly Bove Lodge & Hutz, February 3, 2004: US06686124 (21 worldwide citation)

A multifunctional polymer comprising a polymeric chain having chromophore groups and cross-linking sites is suitable as a resist material and especially as the underlayer for bilayer and top surface imaging strategies. The multifunctional polymer can function as an antireflective coating, planarizin ...


6
Charles Szmanda
Charles R Szmanda, Gary N Taylor, Robert L Brainard, Manuel DoCanto: Photoresist compositions. Shipley Company L L C, Robert L Goldberg, Peter F Corless, Darryl P Frickey, March 2, 1999: US05876899 (10 worldwide citation)

A method for making an acrylic resin photoresist characterized by polymerization of an acrylic monomer in a solvent that dissolves all monomers and resultant polymers. The use of the solvent permits formation of acrylic resins suitable for use in the preparation of photoresists without recovery from ...


7
Charles Szmanda
Charles R Szmanda, Richard J Carey: Modified cation exhange process. Shipley Company, Robert L Goldberg, November 5, 1996: US05571657 (8 worldwide citation)

The invention is a process of removing metal ion contaminants from an organic solution, especially one having acid labile components. The process comprises modifying a cationic exchange resin by treatment with ammonia or amine and contacting said modified ion exchange resin with an organic solution ...


8
Katherina Babich
Katherina Babich, Arpan P Mahorowala, David R Medeiros, Dirk Pfeiffer: Lithographic antireflective hardmask compositions and uses thereof. International Business Machines Corporation, Ryan Mason & Lewis, Daniel P Morris Esq, May 29, 2007: US07223517 (7 worldwide citation)

Compositions and techniques for the processing of semiconductor devices are provided. In one aspect of the invention, an antireflective hardmask composition is provided. The composition comprises a fully condensed polyhedral oligosilsesquioxane, {RSiO1.5}n, wherein n equals 8; and at least one chrom ...


9
Charles Szmanda
Anthony Zampini, Charles R Szmanda, Gary N Taylor, James F Cameron, Gerhard Pohlers: Photoresist compositions for short wavelength imaging. Shipley Company L L C, Peter F Corless, Darryl P Prickey, Edwards & Angell, February 22, 2005: US06858379 (7 worldwide citation)

New photoresists are provided that are suitable for short wavelength imaging, including sub-200 nm such as 157 nm. In one aspect, resists of the invention comprise a fluorine-containing polymer, a photoactive component, and one or more additional components of an amine or other basic composition, a ...


10
Charles Szmanda
Charles R Szmanda, Peter Trefonas III: Negative photoresist composition. Shipley Company L L C, Robert L Goldberg, Peter F Corless, Darryl P Frickey, February 2, 1999: US05866299 (6 worldwide citation)

A photoresist composition and process that minimizes the effect of photogenerated acid migration. The photoresist comprises an alkali soluble resin, a photoacid generating compound that undergoes photolysis within a wavelength of from 330 to 700 nm to yield a strong acid, a crosslinking agent capabl ...



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