11
Shigeru Hirukawa, Issey Tanaka: Exposure apparatus and device manufacturing method. Nikon Corporation, Oliff & Berridge, March 17, 2009: US07505111 (102 worldwide citation)

An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted that moves within a two-dimensional plane holding the substrate. The apparat ...


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Kia Silverbrook: Ink reservoir. Silverbrook Research, September 1, 2009: US07581826 (93 worldwide citation)

The present invention relates to an ink reservoir for being received within the former of a printer roll. The reservoir includes a first portion defining one or more channels for each providing ink to a respective output port. A second portion is also provided which bears one or more ink bladders fo ...


13
Martin E Lee: Exposure apparatus having dynamically isolated support structure. Nikon Corporation, Oliff & Berridge, November 21, 2000: US06151105 (92 worldwide citation)

An exposure apparatus includes an exposure device disposed between a mask and an object. The exposure device exposes a pattern of the mask onto the object. The apparatus also includes a mask stage associated with the exposure device to hold the mask, and a drive to move the mask stage. At least part ...


14
Erik Roelof Loopstra, Leon Martin Levasier, Rene Oesterholt: Lithographic apparatus and method for calibrating the same. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 14, 2007: US07256871 (88 worldwide citation)

Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of t ...


15
Erik Roelof Loopstra, Leon Martin Levasier, Rene Oesterholt: Lithographic apparatus and method for calibrating the same. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, November 6, 2007: US07292312 (84 worldwide citation)

Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of t ...


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Marcel Hendrikus Maria Beems, Joe Sakai: Lithographic apparatus and positioning apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 29, 2008: US07405811 (83 worldwide citation)

A lithographic apparatus comprises a substrate table to hold a substrate, a reference structure and a measurement system to measure a position of the substrate table with respect to the reference structure. The measurement system comprises a first measurement system to measure a position of the subs ...


18
Willem Herman Gertruda Anna Koenen, Arthur Winfried Eduardus Minnaert, Luberthus Ouwehand, Johannes Mathias Theodorus Antonius Adriens, Wouter Onno Pril: Lithographic apparatus and method for determining Z position errors/variations and substrate table flatness. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, February 19, 2008: US07333174 (82 worldwide citation)

A lithographic projection apparatus including an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, the patterning device configured to impart the beam with a pattern in its cross section, a substrate table configured to hold a substra ...


19
Akimitsu Ebihara: Exposure apparatus, and device manufacturing method. Nikon Corporation, Oliff & Berridge, January 22, 2008: US07321419 (80 worldwide citation)

A hydrostatic bearing is provided opposite to a wafer on a table. The hydrostatic bearing maintains the distance between the bearing surface and the wafer in the direction of the optical axis of a projection optical system at a predetermined value.


20
Yuichi Shibazaki: Stage device with frame-shaped member movable in at least three degrees of freedom within a two-dimensional plane. Nikon Corporation, Oliff & Berridge, February 10, 2009: US07489389 (79 worldwide citation)

A stage device includes a stage and a frame-shaped member that move in three degrees of freedom directions in a two-dimensional plane while floating above a surface plate. The stage also holds an object. First fixed elements and second fixed elements are fitted to the frame-shaped member, and cooper ...