1
Erwin Meinders
Erwin Rinaldo Meinders, Maria Peter, Peter Theodorus Maria Giesen, Wilhelmus Johannes Maria de Laat: System for patterning flexible foils. Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO, Maryellen Feehery Hank, Reed Smith, October 29, 2013: US08570491

According to one aspect, the invention provides a table for compensating deformation in flexible foils (1) The table comprises a supportive base (2) and a deformation compensation system (3). This system comprises a plurality of movable elements (4), supported by the base (2), wherein the movable el ...


2
Binnard Michael: Maintaining immersion fluid under a lithographic projection lens. Nikon Corporation, Binnard Michael, ROEDER Steven G, October 21, 2004: WO/2004/090577 (589 worldwide citation)

An apparatus and method for maintaining immersion fluid (212) in the gap adjacent the projection lens (16) during the exchange of a work piece (208) in a lithography machine (10) is disclosed. The apparatus and method includes an optical assembly (16) configured to project an image onto a work piece ...


3
Eaton John K: An electro-osmotic element for an immersion lithography apparatus. Nikon Corporation, Eaton John K, ROEDER Steven G, October 21, 2004: WO/2004/090633 (530 worldwide citation)

An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254), an immersion fluid system (252), an electro-osmotic element (256), and a control system (255). The fluid barrier (254) is positioned near the ...


4
Hazelton Andrew J, Takaiwa Hiroaki: Wafer table for immersion lithography. Nikon Corporation, Hazelton Andrew J, Takaiwa Hiroaki, COSTANTINO Mario A, February 3, 2005: WO/2005/010611 (268 worldwide citation)

Methods and apparatus for allowing a liquid to be substantially contained between a lens (46) and a wafer table (51) assembly of an immersion lithography system are disclosed. According to one aspect of the present invention, an exposure apparatus includes a lens (46) and a wafer table (51) assembly ...


5
Marinus Aart Van Den Brink, Jozef Petrus Henricus Benschop, Erik Roelof Loopstra: Dual stage lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 9, 2007: US07161659 (157 worldwide citation)

The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is ...


6
Shiwen Li: Stage device and exposure apparatus. Nikon Corporation, Oblon Spivak McClelland Maier & Neustadt P C, July 9, 2002: US06417914 (131 worldwide citation)

The shift in the center of gravity of a stage device and the reaction force caused when at least one of a first and second stage devices move, are canceled out by moving a moving member. The shift in the center of gravity of a stage device and the reaction force caused when the stage devices move th ...


7
Shigeru Hirukawa: Exposure apparatus and device manufacturing method. Nikon Corporation, Oliff & Berridge, October 14, 2008: US07436486 (113 worldwide citation)

A lithographic projection apparatus includes an illumination system arranged to condition a radiation beam, a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern, a substrate table configured to hold a substrate ...


8
Shigeru Hirukawa: Exposure apparatus and device manufacturing method. Nikon Corporation, Oliff & Berridge, December 29, 2009: US07639343 (109 worldwide citation)

An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted and that moves within a two-dimensional plane holding the substrate. In addi ...


9
Shigeru Hirukawa: Exposure apparatus and device manufacturing method. Nikon Corporation, Oliff & Berridge, September 15, 2009: US07589821 (108 worldwide citation)

A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent to the substrate. The apparatus includes a liquid diverter in the space to promote liquid flow across the space.


10
Kia Silverbrook: Combined media- and ink-supply cartridge. Silverbrook Research, August 1, 2006: US07084951 (104 worldwide citation)

A printing cartridge includes a hollow core. An ink supply is arranged within the core. A cylindrical former contains the core. A print media supply is wrapped around the former. A cover assembly contains the print media supply and defines a feed opening from which the print media supply is fed. A f ...