61
Martin E Lee: Exposure apparatus having dynamically isolated support structure. Nikon Corporation, Oliff & Berridge, November 21, 2000: US06151105 (92 worldwide citation)

An exposure apparatus includes an exposure device disposed between a mask and an object. The exposure device exposes a pattern of the mask onto the object. The apparatus also includes a mask stage associated with the exposure device to hold the mask, and a drive to move the mask stage. At least part ...


62
Yim Bun Patrick Kwan: Lithographic apparatus, device manufacturing method and device manufacturing thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 30, 2007: US07289212 (91 worldwide citation)

The X, Y and Rx positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be coplanar with the pattern on the ...


63
Kenji Nishi: Exposure apparatus and an exposure method. Nikon Corporation, Oliff & Berridge, August 14, 2007: US07256869 (90 worldwide citation)

A scanning exposure apparatus includes a projection system, a stage system, a first detector and a control system. The stage system has first and second stages, each of which is movable independently in a plane while holding a substrate. The first detector detects focusing information of a vicinity ...


64
Marcel Hendrikus Maria Beems, Joe Sakai: Lithographic apparatus and positioning apparatus. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, March 25, 2008: US07349069 (89 worldwide citation)

A lithographic apparatus comprises a substrate table to hold a substrate, a reference structure and a measurement system to measure a position of the substrate table with respect to the reference structure. The measurement system comprises a first measurement system to measure a position of the subs ...


65
Naomasa Shiraishi: Projection exposure method and apparatus. Nikon Corporation, Miles & Stockbridge P C, June 11, 2002: US06404482 (89 worldwide citation)

In projection exposure of isolated pattern such as a contact hole, in order to increase the depth of focus a coherence reducing member is disposed on a Fourier transform plane in an image-forming optical path between a mask and a sensitized base, so that coherence is reduced between image-forming be ...


66
Toshihiko Ozawa, Masaya Komatsu, Masato Shibuya, Hiroshi Ooki, Masaomi Kameyama, Yoshifumi Tokoyoda: Exposure method and apparatus. Nikon Corporation, Pennie & Edmonds, April 14, 1998: US05739898 (89 worldwide citation)

The present invention relates to a projection exposure method and an exposure apparatus for projecting a pattern on a photo-mask through a projection optical system onto a predetermined photosensitive material. The photosensitive material is a nonlinear photosensitive material in which the effective ...


67
Hiroyoshi Tanabe: Exposure system and illuminating apparatus used therein and method for exposing a resist film on a wafer. NEC Corporation, Young & Thompson, September 24, 1996: US05559583 (89 worldwide citation)

An exposure system includes at least an illuminating system for irradiating a linearly polarized illumination light on a mask with a predetermined pattern and a mounting system on which a wafer is placed, the wafer is provided thereon with a resist film, wherein further provision is made of an eleme ...


68
Kyoichi Suwa, Shigeru Hirukawa, Hiroki Tateno: Method of dimension measurement for a pattern formed by exposure apparatus, and method for setting exposure conditions and for inspecting exposure precision. Nikon Corporation, Shapiro and Shapiro, March 13, 1990: US04908656 (89 worldwide citation)

An exposure method for use in an apparatus for projecting a pattern formed on a mask onto a photosensitive substrate through a projection optical system, comprises the steps of providing a mask bearing a pattern of which width gradually varies in a reference direction on the mask transferring the pa ...


69
Erik Roelof Loopstra, Leon Martin Levasier, Rene Oesterholt: Lithographic apparatus and method for calibrating the same. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 14, 2007: US07256871 (88 worldwide citation)

Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of t ...


70
Kenji Nishi: Stage apparatus, scanning type exposure apparatus, and device produced with the same. Nikon Corporation, Oliff & Berridge, December 18, 2001: US06331885 (88 worldwide citation)

An exposure apparatus has a triangular shaped stage which is movable in a two-dimensional plane while holding a substrate. The stage has a reflecting surface provided on a side face of the stage so that the surface extends in a specific direction intersecting Y axis and X axis. An interferometer rad ...