51
Ebihara Akimitsu, Lee Martin E, Yuan Bausan: Projection optical device and exposure apparatus. Nikon Corporation, Ebihara Akimitsu, Lee Martin E, Yuan Bausan, COSTANTINO Mario A, April 13, 2006: WO/2006/038952 (99 worldwide citation)

A projection optical device includes a projection optical system (PL) which projects an image of a pattern, a support device having a flexible structure (36A, 36B, and 36C) to support the projection optical system, and a positioning device having an actuator to position the projection optical system ...


52
Kazuaki Suzuki: Energy amount control device. Nikon Corporation, Shapiro and Shapiro, March 17, 1992: US05097291 (98 worldwide citation)

An energy amount control device having a pulse energy generating source which produces pulse energy with a predetermined range of energy fluctuations per oscillation, and adjusting voltage applied to the energy generating source to thereby control an energy amount of the pulse energy, the energy amo ...


53
Kanti Jain: Nonlinearity-compensated large-area patterning system. Anvik Corporation, Carl C Kling, March 1, 1994: US05291240 (96 worldwide citation)

This patterning system has the ability to uniformly image a mask onto a substrate having nonlinear exposure characteristics, has large-area exposure capability, and comprises: (a) a stage system capable of synchronously scanning a mask and a substrate in one dimension, and when not scanning in that ...


54
Kenji Nishi, Kazuya Ota: Exposure apparatus and an exposure method. Nikon Corporation, Oliff & Berridge, September 28, 2004: US06798491 (95 worldwide citation)

An exposure apparatus and method displace first and second object holders over a base surface that extends in X- and Y-directions. The first object holder can be displaced from a third area to a second area by using a first displacement unit. The second object holder can be displaced from a first ar ...


55
Kenji Nishi, Kazuya Ota: Exposure apparatus and method. Nikon Corporation, Oliff & Berridge, February 13, 2007: US07177008 (93 worldwide citation)

A scanning exposure apparatus includes a projection system, a stage system, a first detector and a control system. The stage system has first and second stages, each of which is movable independently in a plane while holding a substrate. The first detector detects focusing information of a vicinity ...


56
Michael Jozef Mathijs Renkens, Alexander Matthijs Struycken, Ruben Jan Kok, Martinus Cornells Maria Verhagen: Lithographic apparatus, measurement system, and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 5, 2006: US07102729 (93 worldwide citation)

The invention pertains to a measurement system for measuring displacement of a moveable object relative to a base in at least a first direction of measurement, the moveable object having at least one reference part that is moveable in a plane of movement relative to the base, the actual movements of ...


57
Tsuneo Miyai, Yuji Imai, Tetsuo Taniguchi, Kousuke Suzuki: Thermal distortion compensated projection exposure method and apparatus for manufacturing semiconductors. Nikon Corporation, Shapiro and Shapiro, December 3, 1996: US05581324 (93 worldwide citation)

A projection exposure apparatus has a light source for emitting illumination light, an illumination optical system for illuminating a mask, on which a predetermined pattern is formed, with the illumination light, and a projection optical system for forming an image of the pattern on a photosensitive ...


58
Bernardus Antonius Johannes Luttikhuis, Engelbertus Antonius Fransiscus Van Der Pasch, Ronald Van Der Ham, Niek Jacobus Johannes Roset: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 7, 2007: US07253875 (92 worldwide citation)

A lithographic apparatus includes a measurement system to measure the position and/or movement of a substrate support relative to a reference frame. The measurement system includes a target mounted to one of the substrate support and the reference frame, a radiation source mounted to the other one o ...


59
Christian Alexander Hoogendam, Sjoerd Nicolaas Lambertus Donders, Hans Jansen, Jacobus Johannus Leonardus Hendricus Verspay, Antonius Theodorus Anna Maria Derksen, Joeri Lof, Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens, Alexander Straaijer, Bob Streefkerk: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, September 19, 2006: US07110081 (92 worldwide citation)

In a lithographic projection apparatus, there is provided a liquid supply system comprising a container at least partly defining a space between the projection system and the substrate, the container having a selectively openable and closeable aperture therein, and a closure configured to selectivel ...


60
Johannes Jacobus Matheus Baselmans, Marco Hugo Petrus Moers, Hans Van Der Laan, Robert Wilhelm Willekers, Wilhelmus Petrus De Boeij, Marcus Adrianus Van De Kerkhof: Lithographic projection apparatus, a grating module, a sensor module, a method of measuring wave front aberrations. ASML Netherlands, Pillsbury Winthrop, November 18, 2003: US06650399 (92 worldwide citation)

A lithographic projection apparatus including an illumination system; a support structure for holding a mask; a substrate table for holding a substrate; a projection system for projecting a pattern onto a target portion of the substrate; and an interferometric measurement system for measuring wave f ...