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Erwin Meinders
Erwin Rinaldo Meinders, Maria Peter, Peter Theodorus Maria Giesen, Wilhelmus Johannes Maria de Laat: System for patterning flexible foils. Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO, Maryellen Feehery Hank, Reed Smith, October 29, 2013: US08570491

According to one aspect, the invention provides a table for compensating deformation in flexible foils (1) The table comprises a supportive base (2) and a deformation compensation system (3). This system comprises a plurality of movable elements (4), supported by the base (2), wherein the movable el ...


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Erwin Meinders
Erwin Rinaldo Meinders, Maria Peter, Peter Theodorus Maria Giesen, Wilhelmus Johannes Maria Da Laat: System for patterning flexible foils. Nederlandse Organisatie voor toegepastnatuurwetenschappelijk onderzoek TNO, October 27, 2011: US20110261336-A1

According to one aspect, the invention provides a table for compensating deformation in flexible foils (1) The table comprises a supportive base (2) and a deformation compensation system (3). This system comprises a plurality of movable elements (4), supported by the base (2), wherein the movable el ...


3
Kazuo Takahashi: Immersion type projection exposure apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, March 11, 1997: US05610683 (1008 worldwide citation)

A projection exposure apparatus includes an illuminating device for illuminating a pattern of an original, a holder for holding a substrate, and a projection system for projecting an image of the pattern of the original onto the substrate. The projection system includes a projection optical system a ...


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Binnard Michael: Maintaining immersion fluid under a lithographic projection lens. Nikon Corporation, Binnard Michael, ROEDER Steven G, October 21, 2004: WO/2004/090577 (589 worldwide citation)

An apparatus and method for maintaining immersion fluid (212) in the gap adjacent the projection lens (16) during the exchange of a work piece (208) in a lithography machine (10) is disclosed. The apparatus and method includes an optical assembly (16) configured to project an image onto a work piece ...


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Hazelton Andrew J, Sogard Michael: Environmental system including vaccum scavange for an immersion lithography apparatus. Nikon Corporation, Hazelton Andrew J, Sogard Michael, COSTANTINO Mario A, October 21, 2004: WO/2004/090634 (573 worldwide citation)

An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254) and an immersion fluid system (252). The fluid barrier (254) is positioned near the device (30). The immersion fluid system (252) delivers an i ...


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Novak Thomas W, Hazelton Andrew J, Watson Douglas C: Environmental system including a transport region for an immersion lithography apparatus. Nikon Corporation, Novak Thomas W, Hazelton Andrew J, Watson Douglas C, COSTANTINO Mario A, October 28, 2004: WO/2004/092833 (572 worldwide citation)

An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254), an immersion fluid system (252), and a transport region (256). The fluid barrier (254) is positioned near the device (30) and maintains the tr ...


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Novak Thomas W: Run-off path to collect liquid for an immersion lithography apparatus. Nikon Corporation, Novak Thomas W, COSTANTINO Mario A, October 28, 2004: WO/2004/093160 (552 worldwide citation)

An exposure apparatus (10) for transferring an image to a device (30) includes an optical assembly (16), an immersion fluid system (252), and a device stage assembly (20). The optical assembly (16) is positioned a gap (246) above the device (30). The immersion fluid system (252) fills the gap (246) ...


8
Eaton John K: An electro-osmotic element for an immersion lithography apparatus. Nikon Corporation, Eaton John K, ROEDER Steven G, October 21, 2004: WO/2004/090633 (530 worldwide citation)

An environmental system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid barrier (254), an immersion fluid system (252), an electro-osmotic element (256), and a control system (255). The fluid barrier (254) is positioned near the ...


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