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Stephen T. Avery
Stephen T Avery, John A Durbin, William L Lama, Paul H Stiebitz: Facetted reflector. Xerox Corporation, February 26, 1980: US04190355 (24 worldwide citation)

A facetted reflector faces a linear scanning illumination source and directs light onto an object plane. The tilt angle and length of each linear mirror segment (facet) comprising the reflector are designed to achieve maximum illumination at an object scan line consistent with the geometry of the pa ...


2
Belgacem Haba Belgacem (Bel) Haba
Michael J Nystrom, David B Tuckerman, Belgacem Haba, Giles Humpston, Jesse Burl Thompson: Pin referenced image sensor to reduce tilt in a camera module. Tessera, Lerner David Littenberg Krumholz & Mentlik, September 22, 2009: US07593636 (8 worldwide citation)

The present invention relates to a camera module. The camera module includes a circuit panel having a top side, a bottom side and transparent region, the circuit panel having conductors. The module further includes sensor unit disposed on the bottom side of the circuit panel, and the sensor unit inc ...


3
Stephen T. Avery
Avery Stephen T, James D Rees, Durbin John A, Simpson George R, Green Frederick A: Full-frame flash illumination system for a document copying machine.. Xerox, October 1, 1980: EP0016555-A1 (4 worldwide citation)

A full-frame flash illumination system for a document copying machine including an optical cavity (10) having interior walls coated with a white, diffusely reflecting material. One end (20) of the cavity contains a platen (24) for positioning a document to be copied while the opposing end (30) conta ...


4
Stephen T. Avery
Frederick A Green, George R Simpson, Stephen T Avery, John A Durbin: Full frame flash illumination system utilizing a diffuse integrating optical cavity. Xerox Corporation, June 8, 1982: US04333723 (3 worldwide citation)

An illumination system for a document copying machine including an optical cavity having interior walls coated with a white, diffusely reflecting material. One end of the cavity contains a platen for positioning a document to be copied while the opposing end contains a lens for forming an image of t ...


5
Erwin Meinders
Erwin Rinaldo Meinders, Maria Peter, Peter Theodorus Maria Giesen, Wilhelmus Johannes Maria de Laat: System for patterning flexible foils. Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO, Maryellen Feehery Hank, Reed Smith, October 29, 2013: US08570491

According to one aspect, the invention provides a table for compensating deformation in flexible foils (1) The table comprises a supportive base (2) and a deformation compensation system (3). This system comprises a plurality of movable elements (4), supported by the base (2), wherein the movable el ...


6
Erwin Meinders
Wilhelmus Johannes Maria De Laat, Cheng Qun Gui, Peter Theodorus Maria Giesen, Marcus Theodoor Wilhelmus Van Der Heijden, Erwin Rinaldo Meinders, Mária Péter: Lithographic apparatus and method. Tno, ASML Netherlands, November 8, 2012: US20120281192-A1

A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including directing a beam of radiation at the surface of the flexible substrate; and detecting changes in intensity distribution, or angle of reflection, of the beam of radiation after th ...


7
Erwin Meinders
Erwin Rinaldo Meinders, Maria Peter, Peter Theodorus Maria Giesen, Wilhelmus Johannes Maria Da Laat: System for patterning flexible foils. Nederlandse Organisatie voor toegepastnatuurwetenschappelijk onderzoek TNO, October 27, 2011: US20110261336-A1

According to one aspect, the invention provides a table for compensating deformation in flexible foils (1) The table comprises a supportive base (2) and a deformation compensation system (3). This system comprises a plurality of movable elements (4), supported by the base (2), wherein the movable el ...


8
Erwin Meinders
Erwin Rinaldo Meinders, Peter Theodorus Maria Giesen: Scanned writing of an exposure pattern on a substrate. Nederlandse Organisatie voor toegepast natuurwetenschappelijk onderzoek TNO, Dorsey & Whitney, August 5, 2010: US20100195073-A1

An exposure pattern is written on a substrate, by scanning a light spot along a trajectory over the substrate and switching it on and off according to a desired pattern. Respective spot sizes of the light for illuminating the substrate in respective parts of the trajectory according to a geometry of ...


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