31
Kraemer Friedrich, Mandel Jorn, Mayer Siegfried, Rohrig Klaus, Schulz Hans Peter, Weidenmuller Hilmar, Haverkamp Klaus Dieter, Motz Jurgen: Apparatus for accelerating metallurgical reactions. Rheinstahl Huttenwerke, Burgess Dinklage & Sprung, January 15, 1974: US3785632 (66 worldwide citation)

Apparatus including means for adjusting vertically the level of a mechanical stirring member with respect to the vertical level of a melt, e.g. the vertical level of the interface between the top surface of an iron melt and slagging or the like ingredients floating on such iron melt surface especial ...


32
Jinliang Chen, Yew Ming Chiong: Load chamber with dual heaters. WD Media, January 15, 2013: US08354618 (65 worldwide citation)

A disk processing system with a load chamber having a stationary heater and a movable heater.


33
Seki Masahiko: Impeller replacing device for molten metal stirring equipment. Nippon Steel Corporation, Toren McGeady and Stanger, June 4, 1974: US3814400 (65 worldwide citation)

In a molten metal stirring equipment comprising a hood, a rotary shaft extending through the hood, an impeller attached to the end of the shaft by means of coupling and a molten metal vessel which is taken in and out below the hood, the impeller replacement device comprises a work floor provided on ...


34
Allen J Bourez: Load chamber with heater for a disk sputtering system. WD Media, March 19, 2013: US08399809 (64 worldwide citation)

A disk processing system having a plurality of processing chambers, a load chamber comprising a heater, and a disk transport system coupled to the plurality of processing chambers and the load chamber to transport a disk there among.


35
Mark Thomas Arthur, Frank Henry Miner, Gordon Raymond Roberts: Integral side wall and tap hole cover for an eccentric bottom tap (EBT) electric furnace. South Carolina Systems, Frederick J McCarthy, February 6, 2001: US06185242 (64 worldwide citation)

Spray cooled side wall and tap hole cover for an eccentric bottom tap (EBT) electric furnace which is unitary, i.e. one-piece, and has an inter-connected coolant supply and inter-connected spent coolant drain.


36
Daniel L Brors, Larry R Lane, Mark W Goldsborough, Jason M Samsel, Max van Mastrigt, Robert Foster: Rapid thermal CVD apparatus. Varian Associates, Stanley Z Cole, Gerald M Fisher, Kenneth L Warsh, January 10, 1989: US04796562 (64 worldwide citation)

In a chemical vapor deposition apparatus for coating semiconductor wafers, the wafer is held face down in the reaction chamber. A radiant heat source above the wafer and outside the reaction chamber. The wafer is held on a ring chuck by means of a retractable clamp heats the wafer from its backside ...


37
Yoshiyuki Harima: Vertical heat-treatment apparatus having boat transfer mechanism. Tokyo Electron Sagami, Oblon Spivak McClelland Maier & Neustadt, September 17, 1991: US05048164 (63 worldwide citation)

A vertical heat treatment apparatus heat-treats wafers horizontally carried in a boat while keeping the boat vertical in a reaction tube. The apparatus includes a system for transferring the wafers between the boat and wafer carriers, a system for loading and unloading the wafer-carried boat into an ...


38
Hiroshi Shimizu: Radiant heating apparatus. Ushio Denki Kabushiki Kaisha, Ziems Walter & Shannon, August 6, 1985: US04533820 (63 worldwide citation)

Disclosed herein is a photoheating apparatus for heat-treating an object such as silicon semiconductor wafer in a flowing gas of a special composition. It comprises a container adapted to position the object therein, at least one part of the container being transparent, a heat-radiating lamp adapted ...


39
Stewart C Jepson: Methods and apparatus for improved energy efficient control of an electric arc furnace fume extraction system. Air Liquide America, Linda K Russell, Christopher J Cronin, June 8, 2004: US06748004 (61 worldwide citation)

A fume extraction system includes a combustion zone coupled with an exhaust outlet of a furnace to receive an exhaust gas stream emerging from the furnace outlet during system operation, where the exhaust gas stream includes explosive gases that undergo combustion reactions within the combustion zon ...


40
Yuji Ono, Katsuhiko Mihara: Treatment system including a plurality of treatment apparatus. Tokyo Electron Kabushiki, Tokyo Electron Tohoku Kabushiki Kaisha, Beveridge DeGrandi Weilacher & Young, June 18, 1996: US05527390 (61 worldwide citation)

A treatment system is disclosed, which has a treatment apparatus for performing a predetermined treatment for a planar workpiece contained in a carrier, and a first air-tight carrier storage chamber for storing the carrier. The treatment apparatus has an air-tight second carrier storage chamber. An ...