61
David W Cawlfield, Jerry J Kaczur, Hassan Arabghani: Process for removing catalyst impurities from polyols. Olin Corporation, James B Haglind, F A Iskander, October 19, 1993: US05254227 (42 worldwide citation)

A process for removing an ionic impurity from an impure substantially non-aqueous liquid passes the impure non-aqueous liquid through at least one ion exchange compartment containing an ion exchange medium. The ion exchange compartment is separated from an anode compartment and a cathode compartment ...


62
Thomas L Grimes, Robert Roeland, Frederic H Schadewald: Method for internally electropolishing tubes. The Upjohn Company, Flynn Thiel Boutell & Tanis, November 10, 1987: US04705611 (42 worldwide citation)

An apparatus for internally electropolishing tubes in which a plurality of elongate tubes are horizontally supported and rotatably driven about their length axes. An outlet fitting including an end dam permits rotation of the tube outlet end therein, allows escape of gases from the upper portion of ...


63
Mordechai H Gelchinski, Lubomyr T Romankiw, Donald R Vigliotti, Robert J Von Gutfeld: Laser-enhanced jet-plating and jet-etching: high-speed maskless patterning method. International Business Machines Corporation, Graham S Jones II, February 5, 1985: US04497692 (42 worldwide citation)

This metal deposition/material removal technique modifies free-standing or submerged jet plating with an electromagnetic energy beam such as an intense laser beam, directed collinearly along the jet. Experiments were made to deposit gold contact areas on nickel plated beryllium-copper substrates use ...


64
Masahiro Takahashi, Teruo Miyashita, Akira Morita, Ken Sato: Process for electrograining aluminum substrates for lithographic printing. Nippon Light Metal Research Laboratory, William J Daniel, May 2, 1978: US04087341 (42 worldwide citation)

Aluminum substrates are electrograined for lithographic printing in an electrolytic cell using an electrolyte of hydrochloric acid or nitric acid, and a "regulated alternating current" whereby the inter-electrode voltage is applied with a higher anodic voltage than the cathodic voltage, the ratio of ...


65
Saket Chadda, Chris Barns: Method and apparatus for electrochemical planarization of a workpiece. SpeedFam IPEC Corporation, Snell & Wilmer, October 15, 2002: US06464855 (41 worldwide citation)

An electrochemical planarization apparatus for planarizing a metallized surface on a workpiece includes a platen, a conductive element disposed adjacent the platen and a polishing surface disposed adjacent the conductive element. A workpiece carrier is configured to carry a workpiece and press the w ...


66
Omri M Behr, Marion R Behr: Method and apparatus for producing etched plates for graphic printing. Omri M Behr, May 12, 1992: US05112453 (41 worldwide citation)

There is provided an apparatus and a process for using same for etching a metallic object (22), suitably a plate to prepare a metallic printing plate. The object is partially covered by a resist surface (14) wherein the exposed portions (16) of said metal, will be exposed to the action of an electro ...


67
Gary C Ganzi: Purified ion exchange resins and process. Millipore Corporation, Andrew T Karnakis, Paul J Cook, November 9, 1993: US05259936 (40 worldwide citation)

Purified resin particles are provided in an electrodeionization step for purifying resin particles having ion depletion compartments containing the resin particles and ion concentration compartments. Purified water having a purity of at least 1 megohm-cm is introduced into the ion depletion compartm ...


68
Gregory R Holland, Barrett E Cloud: Lens disinfector and method. Allergan, Frank J Uxa Jr, Gordon L Peterson, July 14, 1992: US05129999 (40 worldwide citation)

An apparatus for disinfecting lenses includes a single hand-held case with a lens compartment and a power supply compartment. A battery powered unit disposed within the power supply compartment responds to activation of a switch on the case to generate an electric current which is coupled to a pair ...


69
Jan Eirik Ellingsen, Gunnar Rölla: Metallic implant and process for treating a metallic implant. AstraZeneca, Fish & Richardson P C, May 23, 2006: US07048870 (39 worldwide citation)

A process for treating a metallic implant consisting essentially of treating the metallic implant with a solution of hydrofluoric acid, which solution has a pH between 1.6 and 3.0.


70
Don R Rohner: Apparatus for selectively exposing a semiconductor topography to an electric field. Advanced Micro Devices, Kevin L Conley Rose & Tayon Daffer, September 7, 1999: US05948219 (39 worldwide citation)

A lithographic apparatus and method are presented which use an electric field to form features from a desired material upon an upper topography of a semiconductor substrate. A layer of an electric field resist material is formed over a layer of the desired material upon the upper topography of the s ...