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Shyam Venkataraman
Raman Vijay Immanuel, Li Yuzhuo, Schade Christian, Venkataraman Shyam Sundar, Yu Shen Eason Su, Usman Ibrahim Sheik Ansar: [fr] COMPOSITION CHIMIQUE DE POLISSAGE MÉCANIQUE COMPRENANT DE LACIDE DE POLYVINYLE PHOSPHONIQUE ET SES DÉRIVÉS, [en] CHEMICAL MECHANICAL POLISHING COMPOSITION COMPRISING POLYVINYL PHOSPHONIC ACID AND ITS DERIVATIVES. Raman Vijay Immanuel, Li Yuzhuo, Schade Christian, Venkataraman Shyam Sundar, Yu Shen Eason Su, Usman Ibrahim Sheik Ansar, BASF SE, BASF, June 27, 2013: WO/2013/093557 (2 worldwide citation)

[en] A chemical mechanical polishing (CMP) composition comprising: (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) at least one type of an organic polymeric compound as a dispersing agent or charge reversal agent comprising a phosphonate (P(=O)(OR1)(OR2) ) or phosp ...


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