1
Bob Hanlon Rajiv Banavali
Rajiv Manohar Banavali, Robert Tryon Hanlon, Alfred Karl Schultz: Method for purification of glycerol from biodiesel production. Rohm and Haas Company, Kenneth Crimaldi, May 19, 2009: US07534923 (2 worldwide citation)

A method for purification of crude glycerol, especially crude glycerol derived from biodiesel production using alkaline catalysts. The method comprises combining the crude glycerol with acid, separating a glycerol layer, and treating the glycerol layer to decolorize it.


2
Bob Hanlon Rajiv Banavali
Rajiv Manohar Banavali, Robert Tryon Hanlon, Alfred Karl Schultz, Jose Antonio Trejo: Method for purification of oils for biodiesel processes. Rohm And Haas Company, June 18, 2009: US20090156847-A1

A method for purification of crude triglycerides to be used as a raw material for production of biodiesel fuel. Crude triglycerides are contacted with a variety of adsorbents and ion exchange resins to reduce the levels of impurities.


3
Bob Hanlon Rajiv Banavali
Rajiv Manohar Banavali, Robert Tryon Hanlon, Alfred Karl Schultz: Method for purification of glycerol from biodiesel production. Rohm And Haas Company, February 19, 2009: US20090048472-A1

A method for purification of crude glycerol, especially crude glycerol derived from biodiesel production using alkaline catalysts. The method comprises combining the crude glycerol with acid, separating a glycerol layer, and treating the glycerol layer to decolorize it.


4
Maricela Morales Charles Szmanda
Charles R Szmanda, George G Barclay, Peter Trefonas, Wang Yueh: Polymer and photoresist compositions. Shipley Company, Edwards & Angell, Dike Bronstein Roberts & Cushman IP Group, November 21, 2002: US20020173680-A1 (1 worldwide citation)

Disclosed are spirocyclic olefin polymers, methods of preparing spirocyclic olefin polymers, photoresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.


5
Sanjay Chaturvedi
Sanjay Chaturvedi, Anne Mae Gaffney, Ruozhi Song, Elsie Mae Vickery: Mixed metal oxide catalyst. Rohm and Haas Company, Marcella M Bodner, August 17, 2004: US06777571 (42 worldwide citation)

A catalyst comprising a mixed metal oxide is useful for the vapor phase oxidation of an alkane or a mixture of an alkane and an alkene to an unsaturated carboxylic acid and for the vapor phase ammoxidation of an alkane or a mixture of an alkane and an alkene to an unsaturated nitrile.


6
Jean-luc Dubois
Jean Luc Dubois, Christophe Duquenne, Wolfgang Holderich: Process for dehydrating glycerol to acrolein. Arkema France, Steven D Boyd, July 8, 2008: US07396962 (25 worldwide citation)

The present invention relates to a process for manufacturing acrolein by dehydration of glycerol in the presence of molecular oxygen. The reaction is performed in the liquid phase or in the gas phase in the presence of a solid catalyst. The addition of oxygen makes it possible to obtain good glycero ...


7
Sanjay Chaturvedi
Sanjay Chaturvedi, Anne Mae Gaffney, Scott Han, Michele Doreen Heffner, Ruozhi Song, Dominique Hung Nhu Le, Elsie Mae Vickery: Promoted multi-metal oxide catalyst. Rohm and Haas Company, Alan Holler, January 7, 2003: US06504053 (24 worldwide citation)

A catalyst comprising a promoted mixed metal oxide is useful for the vapor phase oxidation of an alkane or a mixture of an alkane and an alkene to an unsaturated carboxylic acid and for the vapor phase ammoxidation of an alkane or a mixture of an alkane and an alkene to an unsaturated nitrile.


8
Jean-luc Dubois
Jean Luc Dubois, Christophe Duquenne, Wolfgang Holderich, Jacques Kervennal: Process for dehydrating glycerol to acrolein. Arkema France, Steven D Boyd, February 2, 2010: US07655818 (12 worldwide citation)

The present invention relates to a process for manufacturing acrolein by gas-phase dehydration of glycerol in the presence of strongly acidic solid catalysts with a Hammett acidity H0 of between −9 and −18 and preferably between −10 and −16.


9
Ravi Laxman
Chongying Xu, Thomas H Baum, Alexander S Borovik, Ziyun Wang, James T Y Lin, Scott Battle, Ravi K Laxman: Method for removal of impurities in cyclic siloxanes useful as precursors for low dielectric constant thin films. Advanced Technology Materials, Steven J Hultquist, Intellectual Property Technology Law, Margaret Chappuis, September 19, 2006: US07108771 (11 worldwide citation)

A process for reducing the level(s) of water and/or other impurities from cyclosiloxanes by either azeotropic distillation, or by contacting the cyclosiloxane compositions with an adsorbent bed material. The purified cyclosiloxane material is useful for forming low-dielectric constant thin films hav ...


10
Ravi Laxman
Ziyun Wang, Chongying Xu, Ravi K Laxman, Thomas H Baum, Bryan C Hendrix, Jeffrey F Roeder: Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride. Advanced Technology Materials, Steven J Hultquist, Hultquist IP, Margaret Chappuis, March 22, 2011: US07910765 (10 worldwide citation)

Silicon precursors for forming silicon-containing films in the manufacture of semiconductor devices, such as low dielectric constant (k) thin films, high k gate silicates, low temperature silicon epitaxial films, and films containing silicon nitride (Si3N4), siliconoxynitride (SiOxNy) and/or silicon ...



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