Garo Khanarian
Garo Khanarian, Margaret M Pafford, David Sherrer: Micro-optical device and method of making same. Rohm And Haas Company, August 10, 2006: US20060174652-A1

Micro-optical devices and methods of making the same are disclosed, wherein the disclosed micro-optical devices and methods include passive alignment features.

Larry J Hornbeck: Spatial light modulator. Texas Instruments Incorporated, Melvin Sharp, James T Comfort, Carlton H Hoel, September 11, 1990: US04956619 (560 worldwide citation)

A deflectable beam spatial light modulator formed from a structure of a reflecting layer, typically metal, on a spacer layer, typically photoresist, which in turn is on a substrate containing electronic addressing circuitry is disclosed. Also, the method of fabrication including a plasma etch after ...

Larry J Hornbeck: Spatial light modulator and method. Texas Instruments Incorporated, Carlton H Hoel, Robert O Groover, James T Comfort, January 28, 1986: US04566935 (489 worldwide citation)

Methods of fabrication of spatial light modulators with deflectable beams by plasma etching after dicing of a substrate into chips, each of the chips an SLM, is disclosed. Also, various architectures available with such plasma etching process are disclosed and include metal cloverleafs for substrate ...

John W Palmour, Hua Shuang Kong, John A Edmond: Method of preparing silicon carbide surfaces for crystal growth. Cree Research, Bell Seltzer Park & Gibson, August 7, 1990: US04946547 (399 worldwide citation)

The invention is a method of forming a substantially planar surface on a monocrystalline silicon carbide crystal by exposing the substantially planar surface to an etching plasma until any surface or subsurface damage caused by any mechanical preparation of the surface is substantially removed. The ...

John S Ogle: Method and apparatus for producing magnetically-coupled planar plasma. LAM Research Corporation, Townsend and Townsend, August 14, 1990: US04948458 (379 worldwide citation)

An apparatus for producing a planar plasma in a low pressure process gas includes a chamber and an external planar coil. Radiofrequency resonant current is induced in the planar coil which in turn produces a planar magnetic field within the exclosure. The magnetic field causes circulating flux of el ...

Robert S Blackwood, Rex L Biggerstaff, L Davis Clements, C Rinn Cleavelin: Gaseous process and apparatus for removing films from substrates. FSI Corporation, Texas Instruments Incorporated, Palmatier & Sjoquist, June 7, 1988: US04749440 (352 worldwide citation)

A process for removing at least a portion of a film from a substrate, such as a wafer of silicon or other similar materials, the film on the substrate typically being an oxide film, maintaining the atmosphere embracing the substrate at near room temperature and at near normal atmospheric pressure, f ...

David N Wang, John M White, Kam S Law, Cissy Leung, Salvador P Umotoy, Kenneth S Collins, John A Adamik, Ilya Perlov, Dan Maydan: CVD of silicon oxide using TEOS decomposition and in-situ planarization process. Applied Materials, Schlemmer Dalton Associates, October 10, 1989: US04872947 (351 worldwide citation)

A high pressure, high throughput, single wafer, semiconductor processing reactor is disclosed which is capable of thermal CVD, plasma-enhanced CVD, plasma-assisted etchback, plasma self-cleaning, and deposition topography modification by sputtering, either separately or as part of in-situ multiple s ...

Jeffrey A Forgette, Harlan J Byker, William L Tonar, Frederick T Bauer, David J Cammenga, John K Roberts: Electrochromic rearview mirror incorporating a third surface metal reflector and a display/signal light. Gentex Corporation, Brian Rees, Price Heneveld Cooper DeWitt & Litton, August 29, 2000: US06111684 (276 worldwide citation)

An electrochromic mirror is disclosed for use in a vehicle rearview mirror assembly having a light source positioned behind the electrochromic mirror for selectively projecting light through the mirror. The electrochromic mirror includes front and rear spaced elements each having front and rear surf ...

Salvatore A Celestino, Georges J Gorin, Stephen E Hilliker, Gary B Powell: Plasma reactor apparatus. Tegal Corporation, Paul F Wille, April 1, 1986: US04579618 (272 worldwide citation)

Plasma processing is accomplished with an improved single electrode reactor apparatus. High and low frequency power supplies are coupled to the single electrode to provide increased process flexibility, control and residue removal. A multi-stage passive filter network is disclosed which performs the ...

Hans Joachim Trumpp, Johann Greschner: Method of making structures with dimensions in the sub-micrometer range. International Business Machines Corporation, George O Saile, March 5, 1985: US04502914 (261 worldwide citation)

Following the method of making structures with dimensions in the submicrometer range, structures of a polymeric layer with horizontal and substantially vertical surfaces are first made on a substrate. Thereupon, a silicon nitride or oxide layer is plasma deposited. This layer is subjected to reactiv ...