Belgacem Haba Belgacem (Bel) Haba
Belgacem Haba: Microelectronic packaging methods and components. Tessera, Lerner David Littenberg Krumholz & Mentlik, June 3, 2003: US06572781 (3 worldwide citation)

A sheet including lead regions with conductors and a main region surrounding the lead regions is formed on the front surface of a microelectronic element such as a wafer, or assembled thereto, so that the conductors are connected to contacts on the microelectronic element. After the sheet is in plac ...

Erwin Meinders
Erwin Rinaldo Meinders, Hinke Sijvert Petronella Bouwmans, Julien Jean Xavier De Loynes De Fumichon, Patrick Godefridus Jacobus Maria Peeters: Methods For Mastering And Mastering Substrate. Koninklijke Philips Electronics, Philips Intellectual Property & Standards, June 26, 2008: US20080152936-A1

The present invention relates to a method for providing a high density relief structure in a recording stack (10) of a master substrate (12), particularly a master substrate (12) for making a stamper for the mass-fabrication of optical discs or a master substrate for creating a stamp for micro conta ...

Belgacem Haba Belgacem (Bel) Haba
Belgacem Haba, Irina Poukhova, Masud Beroz: Selective removal of dielectric materials and plating process using same. Tessera, Lerner David Litenberg Krumholz & Mentlik, November 4, 2004: US20040217088-A1

A metal is provided on a polymeric component and the component is subjected to a removal process such as plasma or liquid etching in the presence of an electric field. The etchant selectively attacks the polymer at the boundary between the metal and the polymer, thereby forming gaps alongside the me ...

Larry J Hornbeck: Spatial light modulator and method. Texas Instruments Incorporated, James C Kesterson, James T Comfort, Melvin Sharp, October 29, 1991: US05061049 (719 worldwide citation)

An electrostatically deflectable beam spatial light modulator with the beams (30), address electrodes (42, 46), and landing electrodes (40, 41) to provide soft-landing of the beams on the landing electrodes (40, 41) which gives uniform large-angle deflection plus high reliability.

Amit Kumar, George M Whitesides: Formation of microstamped patterns on surfaces and derivative articles. President And Fellows Of Harvard College, Wolf Greenfield & Sacks, April 30, 1996: US05512131 (707 worldwide citation)

A method of patterning a material surface is provided in which an elastomeric stamp having a stamping surface is coated with a self-assembled monolayer forming species having a functional group selected to bind to a particular material, and the stamping surface is placed against a surface of materia ...

Lilip Lau, William M Hartigan, John J Frantzen: Expandable stents and method for making same. Advanced Cardiovascular Systems, Fulwider Patton Lee & Utecht, June 6, 1995: US05421955 (656 worldwide citation)

The invention is directed to an expandable stent for implantation in a body lumen, such as an artery, and a method for making it from a single length of tubing. The stent consists of a plurality of radially expandable cylindrical elements generally aligned on a common axis and interconnected by one ...

Larry J Hornbeck: Spatial light modulator. Texas Instruments Incorporated, Melvin Sharp, James T Comfort, Carlton H Hoel, September 11, 1990: US04956619 (560 worldwide citation)

A deflectable beam spatial light modulator formed from a structure of a reflecting layer, typically metal, on a spacer layer, typically photoresist, which in turn is on a substrate containing electronic addressing circuitry is disclosed. Also, the method of fabrication including a plasma etch after ...

Larry J Hornbeck: Spatial light modulator and method. Texas Instruments Incorporated, Carlton H Hoel, Robert O Groover, James T Comfort, January 28, 1986: US04566935 (489 worldwide citation)

Methods of fabrication of spatial light modulators with deflectable beams by plasma etching after dicing of a substrate into chips, each of the chips an SLM, is disclosed. Also, various architectures available with such plasma etching process are disclosed and include metal cloverleafs for substrate ...

Franz Laermer, Andrea Schilp: Method of anisotropically etching silicon. Robert Bosch, Spencer & Frank, March 26, 1996: US05501893 (469 worldwide citation)

A method of anisotropic plasma etching of silicon to provide laterally defined recess structures therein through an etching mask employing a plasma, the method including anisotropic plasma etching in an etching step a surface of the silicon by contact with a reactive etching gas to removed material ...

Larry J Hornbeck: Spatial light modulator and method. Texas Instruments Incorporated, Carlton H Hoel, Leo N Heiting, Melvin Sharp, December 1, 1987: US04710732 (462 worldwide citation)

Spatial light modulators with deflectable metal flaps hinged to conducting posts on a substrate are disclosed. The metal flaps and conducting post may be a single piece, and connected to addressing circuitry in the substrate. Also, plasma etching to fabricate the flaps without breakage is disclosed.