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Craig Allen
Desaraju V Varaprasad, Mingtang Zhao, Craig Allen Dornan, Anoop Agrawal, Pierr Marc Allemand, Niall R Lynam: Electrochromic polymeric solid films, manufacturing electrochromic devices using such solid films, and processes for making such solid films and devices. Donnelly Corporation, Fitzpatrick Cella Harper & Scinto, July 16, 2002: US06420036 (221 worldwide citation)

The present invention relates to electrochromic ploymeric solid films, manufacturing electrochromic devices using such solid films and processes for making such solid films and devices. The electrochromic polymeric solid films of the present invention exhibit beneficial properties and characteristic ...


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Erwin Meinders
Erwin Rinaldo Meinders, Hinke Sijvert Petronella Bouwmans: Master Substratus and Methods for Mastering. Koninklijke Philips Electronics, Philips Intellectual Property & Standards, April 24, 2008: US20080095993-A1

The present invention relates to a master substrate (10) for creating a high-density relief structure, particularly a master substrate (10) for making a stamper for the mass fabrication of optical discs or a master substrate for creating a stamp for micro contact printing, wherein an organic dye lay ...


4
Craig Allen
Desaraju V Varaprasad, Mingtag Zhao, Craig Allen Dornan, Anoop Agrawal, Pierr Marc Allemand, Niall R Lynam: Exterior electrochromic reflective mirror element for a vehicular rearview mirror assembly. Donnelly Corporation, Fitzpatrick Cella Harper & Scinto, August 9, 2007: US20070184284-A1

An exterior electrochromic reflective mirror element for a vehicular exterior rearview mirror assembly comprises an electrochromic cross-linked polymeric solid film disposed between a first substrate and a second substrate. The electrochromic cross-linked polymeric solid film contacts a transparent ...


5
Katherina Babich
Marie Angelopoulos, Katherina E Babich, Cameron James Brooks, S Jay Chey, C Richard Guarnieri, Michael Straight Hibbs, Kenneth Christopher Racette: Attenuated embedded phase shift photomask blanks. Dr Daniel P Morris Esq, IBM Corporation, March 18, 2004: US20040053026-A1

An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen or metal, silicon, nitrogen and oxygen. A wide range of optical transmission (0.001% up to 20% at 193 nm) is obtained ...


6
Katherina Babich
Marie Angelopoulos, Katherina Babich, S Jay Chey, Michael Straight Hibbs, Robert N Lang, Arpan Pravin Mahorowala, Kenneth Christopher Racette: Attenuated embedded phase shift photomask blanks. Dr Daniel P Morris Esq, IBM Corporation, October 16, 2003: US20030194569-A1

An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen and oxygen. An etch stop layer is added to improve the etch selectivity of the phase shifting layer. A wide range of ...


7
Katherina Babich
Marie Angelopoulos, Katherina Babich, S Jay Chey, Michael Straight Hibbs, Robert N Lang, Arpan Pravin Mahorowala, Kenneth Christopher Racette: Attenuated embedded phase shift photomask blanks. International Business Machines Corporation, Ibm Corporation, Intellectual Property Law Dept, October 16, 2003: US20030194568-A1

An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen and oxygen. An etch stop layer is added to improve the etch selectivity of the phase shifting layer. A wide range of ...


8
Craig Allen
Desaraju V Varaprasad, Mingtao Zhao, Craig Allen Dornan, Anoop Agrawal, Pierr Marc Allemand, Niall R Lynam: Electrochromic polymeric solid films, manufacturing electrochromic devices using such solid films, and processes for making such solid films and devices. Donnelly Corporation, Fitzpatrick Cella Harper & Scinto, May 8, 2003: US20030087107-A1

The present invention relates to electrochromic polymeric solid films, manufacturing electrochromic devices using such solid films and processes for making such solid films and devices. The electrochromic polymeric solid films of the present invention exhibit beneficial properties and characteristic ...


9
Katherina Babich
Marie Angelopoulos, Katherina E Babich, Cameron James Brooks, S Jay Chey, C Richard Guarnieri, Michael Straight Hibbs, Kenneth Christopher Racette: Attenuated embedded phase shift photomask blanks. Ibm Corporation, Intellectual Property Law Dept, August 29, 2002: US20020119378-A1

An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen or metal, silicon, nitrogen and oxygen. A wide range of optical transmission (0.001% up to 20% at 193 nm) is obtained ...


10
Jose Ferreira
Jean Marc Lemmer, Jose Ferreira, Jens Peter Müller, Scott V Thomsen: Coated article with low-E coating including IR reflecting layer(s) and corresponding method. Centre Luxembourgeois de Recherches pour le Verre et la Ceramique, Guardian, Nixon & Vanderhye P C, April 3, 2007: US07198851 (34 worldwide citation)

A coated article is provided with a low-emissivity (low-E) layer stack for use in a window unit or the like. The layer stack, or coating, may permit the coated article to achieve one or more of a low solar factor (SF) value, a high selectivity (Tvis/SF) value, substantially neutral color at normal a ...