1
Ethan Simon
Mary Jo Kulp, Ethan Scott Simon: Multi-functional polishing pad. Rohm and Haas Electronic Materials CMP Holdings, Blake T Biederman, April 15, 2014: US08697239 (2 worldwide citation)

The polishing pad is suitable for polishing patterned semiconductor substrates containing at least one of copper, dielectric, barrier and tungsten. The polishing pad includes a polymeric matrix; and the polymeric matrix being a polyurethane reaction product of a polyol blend, a polyamine or polyamin ...


2
Ethan Simon
Mary Jo Kulp, Ethan Scott Simon: Multi-functional polishing pad. Rohm And Haas Electronic Materials, Cmp Holdings, January 27, 2011: US20110021123-A1

The polishing pad is suitable for polishing patterned semiconductor substrates containing at least one of copper, dielectric, barrier and tungsten. The polishing pad includes a polymeric matrix; and the polymeric matrix being a polyurethane reaction product of a polyol blend, a polyamine or polyamin ...


3
Ethan Simon
Mary Jo Kulp, Ethan S Simon, Darrell String: Chemical Mechanical Polishing Pad Having Window With Integral Identification Feature. Rohm And Haas Electronic Materials, Cmp Holdings, September 9, 2010: US20100227533-A1

Chemical mechanical polishing pads having a window with an integral identification feature, wherein the window has a polishing face and a nonpolishing face, wherein the integral identification feature is observable through the window, and wherein the integral identification feature identifies the ch ...


4
Wentorf Jr Robert H, Rocco William A: Diamond tools for machining. General Electric Company, July 17, 1973: US3745623 (406 worldwide citation)

Diamond tools and superpressure processes for the preparation thereof are described wherein the diamond content is present either in the form of a mass comprising diamond crystals bonded to each other or of a thin skin of diamond crystals bonded to each other. In each instance the diamond content is ...


5
David R Hall: Composite polycrystalline diamond compact. Smith International, Willian Brinks Olds Hofer Gilson & Lione, August 5, 1986: US04604106 (338 worldwide citation)

The invention is a composite polycrystalline diamond compact comprising at least one layer of diamond crystals and precemented carbide pieces which have been pressed under sufficient heat and pressure to create composite polycrystalline material wherein polycrystalline diamond and the precemented ca ...


6
Harold P Bovenkerk, Paul D Gigl: Temperature resistant abrasive compact and method for making same. General Electric Company, Morgan Finnegan Pine Foley & Lee, September 23, 1980: US04224380 (321 worldwide citation)

In one embodiment, a compact for tools, such as cutting, drilling and shaping tools, consists essentially of self-bonded abrasive particles. The bonded particles define a substantially continuous interconnected network of pores, dispersed throughout the compact. The method for making such a compact ...


7
Jon R Pieper, Richard M Olson, Michael V Mucci, Gary L Holmes, Robert V Heiti: Structured abrasive article. Minnesota Mining and Manufacturing Company, Gary L Griswold, Walter N Kirn, David L Weinstein, October 6, 1992: US05152917 (314 worldwide citation)

A coated abrasive article comprising a backing bearing on at least one major surface thereof abrasive composites comprising a plurality of abrasive grains dispersed in a binder. The binder serves as a medium for dispersing abrasive grains, and it may also bond the abrasive composites to the backing. ...


8
Manoocher Birang, Allan Gleason, William L Guthrie: Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus. Applied Materials, Fish & Richardson, April 13, 1999: US05893796 (312 worldwide citation)

The polishing pad for a chemical mechanical polishing apparatus and a method of making the same. The polishing pad has a covering lawyer with a polishing surface and a backing layer which is adjacent to the platen. A first opening in the covering layer with a first cross-sectional area and a second ...


9
Ulrich Bloecher, Ernest J Duwell: Erodable agglomerates and abrasive products containing the same. Minnesota Mining and Manufacturing Company, Donald M Sell, David L Weinstein, January 24, 1989: US04799939 (284 worldwide citation)

Erodable agglomerates containing individual abrasive grains disposed in an erodable matrix comprising hollow bodies and a binder. The agglomerates are useful for coated abrasives and bonded abrasives. Abrasive products containing the agglomerates provide higher stock removal than abrasive products b ...


10
Mahlon D Dennis: Cutting composite formed of cemented carbide substrate and diamond layer. Diamant Boart Stratabit, Burns Doane Swecker & Mathis, June 9, 1992: US05120327 (271 worldwide citation)

A composite for cutting in subterranean formations comprises a cemented carbide substrate and a diamond layer adhered to a surface of the substrate. That surface includes a plurality of spaced apart ridges forming grooves therebetween. The diamond layer has a thickness greater than a depth of the gr ...



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