1
Hiroshi Yagi, Shigeki Kawano, Kazuo Umeda, Jiro Takei, Yukio Iimura, Satoshi Sasaki, Katsuya Sakayori, Hiroko Amasaki: Method of manufacturing wireless suspension blank. Dainippon Printing, Flynn Thiel Boutell & Tanis P C, September 13, 2005: US06942817 (40 worldwide citation)

A wireless suspension blank is made using a two-layer laminate composed of a metallic layer with the spring property and an electrically insulating layer. The first method includes a first step for working the metallic layer by the photo etching method, a second step for forming a wiring part on the ...


2
Keiji Hashimoto, Junji Fujikawa, Hiroshi Mohri, Masahiro Takahashi, Hiroyuki Miyashita, Yukio Iimura: Halftone phase shift photomask, halftone phase shift photomask blank, and methods of producing the same. Dai Nippon Printing, Mitsubishi Electric Corporation, Sughrue Mion Zinn Macpeak & Seas, July 23, 1996: US05538816 (29 worldwide citation)

A halftone phase shift photomask designed so that it is possible to shorten the photoengraving process, use a production line for a conventional photomask, prevent lowering of the contract between the transparent and semitransparent regions at a long wavelength in the visible region, which is used f ...


3
Junji Fujikawa, Yukio Iimura, Masahiro Takahashi, Takashi Nishimoto, Hiroyuki Matsui, Masanobu Fujita: Chromium blanks for forming black matrix-screen and color filter for liquid crystal display. Dai Nippon Printing, Parkhurst Wendel & Burr L, January 7, 1997: US05592317 (20 worldwide citation)

A chromium blank for forming a black matrix-screen to be used as a color filter for a liquid crystal display is formed by forming at least a first antireflection film, a second antireflection film and a screening film sequentially in that order on one major surface of a transparent substrate. Each o ...


4
Norihiro Tarumoto, Hiroyuki Miyashita, Yukio Iimura, Koichi Mikami: Phase shift photomask, phase shift photomask blank, and process for fabricating them. Dai Nippon Printing, Sughrue Mion Zinn Macpeak & Seas PLLC, December 30, 1997: US05702847 (18 worldwide citation)

The invention relates to a phase shift photomask in which the peripheral region portion of a phase shift layer is removed by a relatively simple procedure and which has no or little defect and is inexpensive, a blank therefor, and a process for fabricating them. The process includes the steps of for ...


5
Yukio Iimura, Makoto Nishizawa, Kazuhito Kobayashi, Haruyuki Matsubayashi, Nobuyuki Asanuma, Yutaka Yamaguchi, Kiyoshi Sasaki, Yasumasa Sugiyama: Filling step control method of injection molding machine. Toshiba Kikai Kabushiki Kaisha, Pillsbury Winthrop, September 9, 2003: US06616871 (15 worldwide citation)

A filling step control method of an injection molding machine for filling a molten resin into a die cavity is provided. The control method has the steps of: sampling in initiating the filling step for filling the molten resin into the die cavity by controlling an injection speed and, thereafter, by ...


6
Keiji Hashimoto, Junji Fujikawa, Hiroshi Mohri, Masahiro Takahashi, Hiroyuki Miyashita, Yukio Iimura: Blanks for halftone phase shift photomasks, halftone phase shift photomasks, and methods for fabricating them. Dai Nippon Printing, Sughrue Mion Zinn Macpeak & Seas, March 25, 1997: US05614335 (10 worldwide citation)

The invention relates a halftone phase shift photomask and a blank therefor, which enables the transmittance of a phase shift portion to be varied even after blank or photomask fabrication, can accommodate to a variety of patterns, and can be fabricated on a mass scale. The exposure light transmitta ...


7
Hiroshi Mohri, Keiji Hashimoto, Masahiro Takahashi, Wataru Goto, Yukio Iimura: Photomask blank and phase shift photomask. Dai Nippon Printing, Dellett and Walters, May 30, 1995: US05419988 (8 worldwide citation)

A phase shift photomask and a photomask blank used to produce the same. A dry etching stopper layer, which is disposed between a substrate and a light-shielding layer or between the substrate and a phase shifter layer, is made of either a film mainly composed of tin oxide nitride, which has high etc ...


8
Haruyuki Matsubayashi, Akira Kanda, Takamitsu Yamashita, Takashi Yamazaki, Yukio Iimura, Yutaka Yamaguchi, Masamitsu Suzuki: Malfunction-detecting method in injection molding machines. Toshiba Machine, Pillsbury Winthrop, December 30, 2003: US06669877 (8 worldwide citation)

This invention provides a method which makes it possible to reliably detect malfunctions during the ejecting step without rendering the injection molding machine more complicated. An ejector pin is incorporated in the movable die. This ejector pin is connected, via an ejector plate, a connecting rod ...


9
Makoto Nishizawa, Toshihiro Kasai, Kazuhito Kobayashi, Yukio Iimura: Method and apparatus for mold clamping in an injection molding machine and the like. Toshiba Kikai Kabushiki Kaisha, Pillsbury Winthrop Shaw Pittman, August 23, 2005: US06932924 (5 worldwide citation)

Method for mold clamping of the present invention is capable of shortening a molding cycle without any initial setting works for an engaging position of a tie bars. The method is constituted the steps of moving the tie bars in the direction of mold closing during mold close operation, judging a rela ...


10
Yukio Iimura, Masakazu Kanemoto, Mitsunori Kokubo: Imprinting apparatus. Toshiba Kikai Kabushiki Kaisha, DLA Piper, September 7, 2010: US07789653 (4 worldwide citation)

According to an aspect of the present invention, an imprinting apparatus is provided with: a mount to support a subject body; a movable body capable of moving away from and close to the mount; a support swingably attached to the movable body; a template being attached to the support and including an ...