1
Yuichi Shibazaki: Stage device with frame-shaped member movable in at least three degrees of freedom within a two-dimensional plane. Nikon Corporation, Oliff & Berridge, February 10, 2009: US07489389 (79 worldwide citation)

A stage device includes a stage and a frame-shaped member that move in three degrees of freedom directions in a two-dimensional plane while floating above a surface plate. The stage also holds an object. First fixed elements and second fixed elements are fitted to the frame-shaped member, and cooper ...


2
Yuichi Shibazaki: Stage drive method and stage unit, exposure apparatus, and device manufacturing method. Nikon Corporation, Oliff & Berridge, September 15, 2009: US07589822 (57 worldwide citation)

When a transition from a first state where one stage is positioned at a first area directly below projection optical system to which liquid is supplied to a state where the other stage is positioned at the first area, both stages are simultaneously driven while a state where both stages are close to ...


3
Yuichi Shibazaki: Stage drive method and stage unit, exposure apparatus, and device manufacturing method. Nikon Corporation, Oliff & Berridge, October 25, 2011: US08045136 (41 worldwide citation)

A lithographic projection apparatus includes a substrate table to hold a substrate, a projection system to project a patterned beam of radiation onto the substrate and a liquid confinement structure to confine a liquid in a space between the projection system and the substrate, the substrate, the su ...


4
Yuichi Shibazaki: Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus, and device manufacturing method. Nikon Corporation, Oliff & Berridge, November 23, 2010: US07839485 (25 worldwide citation)

Positional information of a movable body in a Y-axis direction is measured using an interferometer and an encoder whose short-term stability of measurement values excels when compared with the interferometer, and based on the measurement results, a predetermined calibration operation for obtaining c ...


5
Yuichi Shibazaki: Optical element holding device for exposure apparatus. Nikon Corporation, Synnestvedt & Lechner, August 16, 2005: US06930842 (20 worldwide citation)

An optical element holding device includes a ring body for accommodating an optical element and a drive mechanism for driving the optical element. The ring body has an inner ring portion, which engages with a peripheral edge of the optical element, and an outer ring portion integral with the inner r ...


6
Yuichi Shibazaki: Movable body drive method and system, pattern formation method and apparatus, exposure method and apparatus for driving movable body based on measurement value of encoder and information on flatness of scale, and device manufacturing method. Nikon Corporation, Oliff & Berridge, September 6, 2011: US08013982 (19 worldwide citation)

A drive unit drives a wafer stage in a Y-axis direction based on a measurement value of an encoder that measures position information of the wafer stage in the Y-axis direction and based on information on the flatness of a scale that is measured by the encoder. In this case, the drive unit can drive ...


7
Yuichi Shibazaki: Movable body drive system and movable body drive method, pattern formation apparatus and method, exposure apparatus and method, device manufacturing method, and decision-making method. Nikon Corporation, Oliff, March 18, 2014: US08675171 (17 worldwide citation)

A drive unit drives a wafer table in a Y-axis direction based on a measurement value of an encoder that measures position information of the wafer table in the Y-axis direction and based on known correction information in accordance with position information of the wafer table in a non-measurement d ...


8
Yuichi Shibazaki: Movable body drive method and system, pattern formation method and apparatus, exposure method and apparatus for driving movable body based on measurement value of encoder and information on flatness of scale, and device manufacturing method. Nikon Corporation, Oliff & Berridge, June 19, 2012: US08203697 (17 worldwide citation)

A drive unit drives a wafer stage in a Y-axis direction based on a measurement value of an encoder that measures position information of the wafer stage in the Y-axis direction and based on information on the flatness of a scale that is measured by the encoder. In this case, the drive unit can drive ...


9
Yuichi Shibazaki: Optical element holding apparatus. Nikon Corporation, Synnestvedt & Lechner, December 26, 2006: US07154684 (13 worldwide citation)

An optical element holding apparatus provided with a holding portion for holding a flange portion of an optical element. The holding portion includes a bearing surface block having a bearing surface, which contacts the flange portion, and a bearing surface block support mechanism, which rotatably su ...


10
Kazuya Ono, Yuichi Shibazaki: Coupling apparatus, exposure apparatus, and device fabricating method. Nikon Corporation, Oliff & Berridge, November 17, 2009: US07619715 (12 worldwide citation)

An exposure apparatus is an exposure apparatus that exposes a substrate by filling a liquid between a projection optical system and the substrate, and projecting a pattern image onto the substrate via the projection optical system and the liquid, wherein the projection optical system has a first gro ...