1
Ho Chung Peng, Nafus Kathleen, Yoshioka Kaz, Yamaguchi Richard: Method and system for drying a substrate. Tokyo Electron, Ho Chung Peng, Nafus Kathleen, Yoshioka Kaz, Yamaguchi Richard, MAIER Gregory J, March 17, 2005: WO/2005/024325 (356 worldwide citation)

A method and system is described for drying a thin film on a substrate following liquid immersion lithography. Drying the thin film to remove immersion fluid from the thin film is performed prior to baking the thin film, thereby reducing the likely hood for interaction of immersion fluid with the ba ...


2
Ho Chung Peng, Nafus Kathleen, Yoshioka Kaz, Yamaguchi Richard: Method and system for drying a substrate. Tokyo Electron, May 24, 2006: EP1658622-A2

A method and system is described for drying a thin film on a substrate following liquid immersion lithography. Drying the thin film to remove immersion fluid from the thin film is performed prior to baking the thin film, thereby reducing the likely hood for interaction of immersion fluid with the ba ...


3
Ho Chung Peng, Nafus Kathleen, Yoshioka Kaz, Yamaguchi Richard: Method and system for drying a substrate. Tokyo Electron, xiao shanqiang, September 6, 2006: CN200480022034

A method and system is described for drying a thin film on a substrate following liquid immersion lithography. Drying the thin film to remove immersion fluid from the thin film is performed prior to baking the thin film, thereby reducing the likely hood for interaction of immersion fluid with the ba ...


4
Ho Chung Peng, Nafus Kathleen, Yoshioka Kaz, Yamaguchi Richard: Method and system for drying a substrate. Tokyo Electron, May 3, 2006: KR1020057023953

A method and system is described for drying a thin film on a substrate following liquid immersion lithography. Drying the thin film to remove immersion fluid from the thin film is performed prior to baking the thin film, thereby reducing the likely hood for interaction of immersion fluid with the ba ...



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