1
Yoshihiro Hosaka, Yoichi Kamoshida, Yoshiyuki Harita, Kunihiro Harada: Positive type photosensitive resin composition with at least two o-quinone diazides. Japan Synthetic Rubber, Oblon Fisher Spivak McClelland & Maier, February 12, 1985: US04499171 (37 worldwide citation)

A positive type photosensitive resin composition comprising an alkali-soluble novolac resin and (A) a compound represented by the following general formula (I) and a compound represented by the following general formula (II) or (B) a compound represented by the following general formula (III) and a ...


2
Yoshihiro Hosaka, Yoshiyuki Harita, Mitsuo Kurokawa, Kunihiro Harada, Eijiro Tagami: Photosensitive compositions and printing plates containing same. Japan Synthetic Rubber, Oblon Fisher Spivak McClelland & Maier, June 23, 1981: US04275142 (32 worldwide citation)

A photosensitive resin composition comprising (I) a copolymer containing (A) 10 to 95 mol % of a conjugated diolefinic hydrocarbon, (B) 5 to 90 mol % of an .alpha.,.beta.-ethylenically unsaturated carboxylic acid and (C) 0 to 85 mol % of a monoolefinically unsaturated compound, (II) a photosensitize ...


3
Yoshihiro Hosaka, Ikuo Nozue, Masashige Takatori, Yoshiyuki Harita: Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent. Japan Synthetic Rubber, Oblon Spivak McClelland Maier & Neustadt, April 11, 1995: US05405720 (31 worldwide citation)

A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymonocarboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage ...


4
Yoshihiro Hosaka, Ikuo Nozue, Masashige Takatori, Yoshiyuki Harita, Kiyoshi Honda: Positive type radiation-sensitive resin composition. Japan Synthetic Rubber Co, Oblon Spivak McClelland Maier & Neustadt, February 11, 1992: US05087548 (23 worldwide citation)

A positive type radiation-sensitive resin composition which comprises a 1,2-quinonediazide compound and an alkali-soluble novolac resin produced by poly-condensing phenols represented by the formulas (I) and (II) in a molar ratio of (I)/(II) of 1/99 to 100/0 with a carbonyl compound: ##STR1## wherei ...


5
Yoshihiro Hosaka, Ikuo Nozue, Masashige Takatori, Yoshiyuki Harita: 1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent. Japan Synthetic Rubber, Oblon Spivak McClelland Maier & Neustadt, June 1, 1993: US05215857 (23 worldwide citation)

A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymonocarboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage ...


6
Yoshihiro Hosaka, Ikuo Nozue, Masashige Takatori, Yoshiyuki Harita: Radiation-sensitive composition containing 1,2-quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent. Japan Synthetic Rubber, Oblon Spivak McClelland Maier & Neustadt, August 24, 1993: US05238774 (16 worldwide citation)

A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymonocarboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage ...


7
Yoshihiro Hosaka, Yoichi Kamoshida, Yoshiyuki Harita, Kunihiro Harada: Positive type photosensitive resin composition. Japan Synthetic Rubber, Oblon Fisher Spivak McClelland & Maier, May 17, 1983: US04384037 (14 worldwide citation)

A photosensitive resin composition comprising a 1,2-quanonediazide compound and a copolymer consisting essentially of (A) a conjugated diolefinic compound, (B) a monoolefinically unsaturated compound and (C) an .alpha.,.beta.-ethylenically unsaturated carboxylic acid. Said composition can provide a ...


8
Yoshihiro Hosaka, Ikuo Nozue, Masashige Takatori, Yoshiyuki Harita: Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent. JSR Corporation, Steven B Kelber, Long Aldridge & Norman, February 1, 2000: US06020104 (12 worldwide citation)

A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymono-carboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storag ...


9
Yoshihiro Hosaka, Ikuo Nozue, Masashige Takatori, Yoshiyuki Harita: Radiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solvent. JSR Corporation, Oblon Spivak McClelland Maier & Neustadt P C, July 20, 1999: US05925492 (11 worldwide citation)

A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monoxymono-carboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage ...


10
Yoshihiro Hosaka, Ikuo Nozue, Masashige Takatori, Yoshiyuki Harita: Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent. Japan Synthetic Rubber, Oblon Spivak McClelland Maier & Neustadt, February 27, 1996: US05494784 (11 worldwide citation)

A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymonocarboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage ...