1
Yoshihiro Yamaguchi, Soichi Sato, Jun Suzuki, Tetsuya Kohno, Tota Hasegawa, Yuichiro Ishii, Yoshifumi Ueno: Information processing method and apparatus and medium. Sony Corporation, William S Frommer, Dennis M Smid, Frommer Lawrence & Haug, March 23, 2004: US06710771 (99 worldwide citation)

An information processing method and apparatus free from a defect in a conventional system that complicated processing operations need to be executed before a user selects a desired application program on a task bar equipped with a start menu button and starts the selected program. A jog dial relate ...


2
Yoshifumi Ueno, Hiroshi Takamatsu, Noriaki Kudo: Flexible flat cable. Sony Chemical & Information Device Corporation, Bell Boyd & Lloyd, July 15, 2008: US07399929 (10 worldwide citation)

A flexible flat cable is provided. The FFC comprises multiple conductors with widths of 0.3(±0.03)mm arranged in a parallel manner with a pitch of 0.5 (±0.05)mm, the first insular material and the second insular material sandwiching these conductors from both sides, shield material, and the reinforc ...


3
Yoshifumi Ueno, Georg Soumagne, Shinji Nagai, Akira Endo, Tatsuya Yanagida: Extreme ultraviolet light source apparatus. Gigaphoton, McDermott Will & Emery, November 29, 2011: US08067756 (10 worldwide citation)

In an extreme ultraviolet light source apparatus generating an extreme ultraviolet light from a plasma generated by irradiating a target, which is a droplet D of molten Sn, with a laser light, and controlling the flow direction of ion generated at the generation of the extreme ultraviolet light by a ...


4
Masato Moriya, Yoshifumi Ueno, Tamotsu Abe, Akira Sumitani: Method for cleaning optical element of EUV light source device and optical element cleaning device. Gigaphoton, Husch Blackwell, September 4, 2012: US08256441 (9 worldwide citation)

A method for cleaning an optical element of an extreme ultraviolet light source device for removing, from the optical element in a chamber, scattered matter generated together with extreme ultraviolet light by plasma formed through laser beam excitation of a target in the chamber, the method which c ...


5
Hiroshi Komori, Yoshifumi Ueno, Georg Soumagne: Extreme ultra violet light source device. Komatsu, Gigaphoton, McDermott Will & Emery, March 27, 2012: US08143606 (7 worldwide citation)

An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies ...


6
Yoshifumi Ueno, Yokihiro Takikawa: Wiring boards. Sony Chemicals, Osha & May L, August 17, 2004: US06777622 (7 worldwide citation)

In a flexible wiring board of the present invention, a first shield film is connected to a ground wiring at the bottom of an opening in a cover film. The first shield film is connected to a second shield film via a through-hole penetrating from the surface to the rear surface of a base film. Thus, t ...


7
Yoshifumi Ueno, Georg Soumagne, Akira Sumitani, Osamu Wakabayashi: Extreme ultra violet light source apparatus. Komatsu, Gigaphoton, Wenderoth Lind & Ponack L, March 29, 2011: US07915600 (6 worldwide citation)

An extreme ultra violet light source apparatus has a relatively high output for exposure and suppresses the production of debris as much as possible instead of disposing of debris that has been produced. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra viole ...


8
Yoshifumi Ueno, Osamu Wakabayashi, Tamotsu Abe, Akira Sumitani, Hideo Hoshino, Akira Endo, Georg Soumagne: Apparatus for and method of withdrawing ions in EUV light production apparatus. Gigaphoton, Kratz Quintos & Hanson, July 23, 2013: US08492738 (5 worldwide citation)

An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a col ...


9
Hiroshi Komori, Tatsuya Yanagida, Yoshifumi Ueno, Akira Sumitani, Akira Endo, Tsukasa Hori: Extreme ultraviolet light source device and method for generating extreme ultraviolet light. Gigaphoton, McDermott Will & Emery, April 29, 2014: US08710475 (4 worldwide citation)

An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the e ...


10
Hiroshi Komori, Yoshifumi Ueno, Georg Soumagne: Extreme ultra violet light source device. Gigaphoton, McDermott Will & Emery, November 19, 2013: US08586953 (4 worldwide citation)

An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies ...