1
Yoshiaki Komatsubara, Kyozoh Ide, Eiko Munakata: Liquid crystal display device. Tokyo Shibaura Denki Kabushiki Kaisha, Oblon Fisher Spivak McClelland & Maier, May 28, 1985: US04519678 (74 worldwide citation)

A reflective type liquid crystal display device and a method of manufacturing the same. The liquid crystal display device comprises a transparent first substrate, a second substrate, a reflective metal film and liquid crystal filled in a gap between the first substrate and the reflective metal film. ...


2
Naoki Suzuki, Noriyuki Hirata, Masatoshi Shimizu, Takuo Higashijima, Hiroaki Takahashi, Yoshiaki Komatsubara: Treatment device, laser annealing device, manufacturing apparatus, and manufacturing apparatus for flat display device. Kabushiki Kaisha Toshiba, Pillsbury Winthrop, August 7, 2001: US06270619 (29 worldwide citation)

A film forming device in a substrate manufacturing apparatus a stage section on which a cassette storing a plurality of glass substrates is mounted. A treatment section for subjecting the substrate to a predetermined treatment is arranged to oppose the stage section. A washing section for washing th ...


3
Nozomu Harada, Yoshiaki Komatsubara: Method of manufacturing a solid-state image pickup device. Kabushiki Kaisha Toshiba, Oblon Fisher Spivak McClelland & Maier, September 2, 1986: US04608749 (21 worldwide citation)

A method of manufacturing a "two-level" solid-state image pickup device wherein a portion of a first metallic electrode electrically connected to a signal storage region is made to project to the highest position above a substrate on which it is formed. A coating of an organic insulating film is the ...


4
Masanori Abe, Yoshiaki Komatsubara, Tsuyoshi Iyama: Method for manufacturing liquid crystal display device. Kabushiki Kaisha Toshiba, Cushman Darby & Cushman, May 28, 1991: US05019001 (10 worldwide citation)

In a method for manufacturing a liquid crystal display device, address and data lines are provided over a substrate, and a short-circuit area and an area to be made short-circuit are provided to cause short-circuiting between the address and data lines. It is prevented a TFT array from dielectric br ...


5
Yoshio Ogawa, Naobumi Hashimoto, Kazushige Kawamura, Akira Kumagai, Toshiaki Urata, Yoshiaki Komatsubara: Wet desulfurization process for treating a flue gas. Chiyoda Corporation, Lorusso & Loud, March 27, 1990: US04911901 (7 worldwide citation)

A process for treating a flue gas containing sulfur dioxide and fly ash is disclosed in which an aqueous absorbent liquid is sprayed into the glue gas stream, and the resulting gas is fed to a vertical, open-ended pipe to form a jet annular stream, so that portions of the SO.sub.2 and the fly ash co ...


6
Hiroshi Yanagioka, Yoshio Ogawa, Yoshiaki Komatsubara, Kenji Kobayashi: Method and apparatus for the treatment of a waste gas containing dists and chemical contaminants. Chiyoda Corporation, Lorusso & Loud, July 8, 1997: US05645802 (5 worldwide citation)

A method and apparatus for the treatment of a waste gas containing dust and chemical contaminants are disclosed. The apparatus includes a combination of a cooling/dust-eliminating chamber and a chemical treatment chamber in a single container. The first mentioned chamber is provided with sprayers fo ...


7
Naoki Suzuki, Noriyuki Hirata, Masatoshi Shimizu, Takuo Higashijima, Hiroaki Takahashi, Yoshiaki Komatsubara: Treatment device, laser annealing device, manufacturing apparatus, and manufacturing apparatus for flat display device. Kabushiki Kaisha Toshiba, Pillsbury Winthrop, July 8, 2003: US06588232 (3 worldwide citation)

A film forming device in a substrate manufacturing apparatus a stage section on which a cassette storing a plurality of glass substrates is mounted. A treatment section for subjecting the substrate to a predetermined treatment is arranged to oppose the stage section. A washing section for washing th ...


8
Hiroshi Yanagioka, Yoshio Ogawa, Yoshiaki Komatsubara, Kenji Kobayashi: Method and apparatus for the treatment of a waste gas containing dusts and chemical contaminants. Chiyoda Corporation, Lorusso & Loud, June 9, 1992: US05120518 (2 worldwide citation)

A method and apparatus for the treatment of a waste gas containing dust and chemical contaminants are disclosed. The apparatus includes a combination of a cooling/dust-eliminating chamber and a chemical treatment chamber in a single container. The first mentioned chamber is provided with sprayers fo ...