1
Yim Bun Patrick Kwan: Lithographic apparatus, device manufacturing method, and device manufactured thereby. ASML Netherland, Pillsbury Winthrop, November 16, 2004: US06819425 (107 worldwide citation)

The X, Y and Rx positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be co-planar with the pattern on the ...


2
Yim Bun Patrick Kwan: Lithographic apparatus, device manufacturing method and device manufacturing thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 30, 2007: US07289212 (91 worldwide citation)

The X, Y and Rx positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be coplanar with the pattern on the ...


3
Yim Bun Patrick Kwan, Leon Martin Levasier: Method for calibrating a lithographic projection apparatus and apparatus capable of applying such a method. ASML Netherlands, Pillsbury Winthrop, March 23, 2004: US06710849 (37 worldwide citation)

A method for calibrating a lithographic projection apparatus includes identifying a set of two or more reference positions of one a first and a second object table WTa, WTb or MT with a first detection system and simultaneously measuring those reference positions with a first position measuring syst ...


4
Yim Bun Patrick Kwan: Lithographic apparatus, device manufacturing method and device manufactured thereby. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, July 14, 2009: US07561270 (7 worldwide citation)

The X, Y and Rz positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be coplanar with the pattern on the ...


5
Stefan Xalter, Yim Bun Patrick Kwan, Andras G Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh: Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus. Carl Zeiss SMT, Fish & Richardson P C, December 25, 2012: US08339577 (6 worldwide citation)

An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection ...


6
Yim Bun Patrick Kwan: Calibrating a lithographic apparatus. ASML Netherlands, Sterne Kessler Goldstein & Fox P L L C, December 15, 2009: US07633619 (5 worldwide citation)

The X, Y and Rz positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be coplanar with the pattern on the ...


7
Yim Bun Patrick Kwan, Michael Mühlbeyer, Johannes Lippert: Device consisting of at least one optical element. Carl Zeiss SMT, Ohlandt Greeley Ruggiero & Perle L, October 13, 2009: US07603010 (5 worldwide citation)

An optical assembly comprises at least one optical element movable in at least two degrees of freedom and at least one actuator for adjusting the least one optical element; at least one sensor for sensing the position of the at least one element in at least two degrees of freedom and is characterize ...


8
Yim Bun Patrick Kwan: Optical imaging arrangement. Carl Zeiss SMT, Fish & Richardson P C, October 19, 2010: US07817248 (5 worldwide citation)

There is provided an optical imaging arrangement comprising: a mask unit comprising a pattern, a substrate unit comprising a substrate, an optical projection unit comprising a group of optical element units, the optical projection unit being adapted to transfer an image of the pattern onto the subst ...


9
Yim Bun Patrick Kwan: Gas bearing and lithographic apparatus including such a bearing. ASM Lithography, Pillsbury Winthrop, October 2, 2001: US06296990 (5 worldwide citation)

A gas (air) beating in a ceramic body is made using a separate restriction member to define the air restriction feature. The separate member may be a metal bushing in which an insert is fitted, the insert having an opening defining the actual restriction feature. Alternatively the separate member ma ...


10
Hermann Bieg, Karl Eugen Aubele, Yim Bun Patrick Kwan, Stefan Xalter, Martin Schmidt, Saverio Sanvido, Uy Liem Nguyen: Optical assembly. Carl Zeiss SMT, Fish & Richardson P C, April 19, 2011: US07929227 (3 worldwide citation)

An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one m ...