1
Erik R Loopstra, Gerrit M Bonnema, Harmen K Van Der Schoot, Gerjan P Veldhuis, Yim Bun P Kwan: Positioning device having two object holders. ASM Lithography, Pillsbury Winthrop, July 17, 2001: US06262796 (335 worldwide citation)

A positioning device has first and second object holders that are guided over a guiding surface extending parallel to an X-direction and parallel to a Y-direction perpendicular to the X-direction and which are displaceable over the guiding surface from a first position into a second position by mean ...


2
Yim Bun P Kwan: Balanced positioning system for use lithographic apparatus. ASML Netherlands, Pillsbury Winthrop, September 10, 2002: US06449030 (75 worldwide citation)

A balanced positioning system for use in lithographic apparatus having a pair of balance masses which are supported so as to be moveable in at least one degree of freedom, such as Y translation. Oppositely directed drive forces in this degree of freedom act directly between the driven body and the b ...


3
Raymond L J Schrijver, Tjarko A R van Empel, Marcel K M Baggen, Bernardus A J Luttikhuis, Yim Bun P Kwan, Erik R Loopstra: Purge gas systems for use in lithographic projection apparatus. ASML Netherlands, Pillsbury Winthrop, April 1, 2003: US06542220 (33 worldwide citation)

A lithographic apparatus has at least one compartment closely surrounding at least one of the mask and substrate holders but not either of the illumination or projection systems so as to reduce the volume that must be purged with gas transparent to the projection radiation. In a scanner, the compart ...


4
Yim Bun P Kwan, Wilhelmus J T P van de Wiel: Balanced positioning system for use in lithographic apparatus. ASML Netherlands, Pillsbury Winthrop, February 25, 2003: US06525803 (18 worldwide citation)

A balanced positioning apparatus comprises a balance mass which is supported so as to be moveable in the three degrees of freedom, such as X and Y translations and rotation about the Z-axis. Drive forces in these degrees of freedom act directly between the positioning body and the balance mass. Reac ...


5
Yim Bun P Kwan, Serge F C L Wetzels, Gerjan P Veldhuis: Positioning system for use in lithographic apparatus. ASML Netherlands, Pillsbury Winthrop, October 21, 2003: US06635887 (18 worldwide citation)

A positioning system, such as may be used to position a moveable object table in three degrees of freedom. More particularly, the invention relates to the use of the positioning system in a lithographic projection apparatus including an illumination system for supplying a projection beam of radiatio ...


6
Erik R Loopstra, Yim Bun P Kwan, Marcel J E H Muitjens, Sonja T De Vrieze Voorn: Lithographic projection apparatus having a temperature controlled heat shield. ASML Netherlands, Pillsbury Winthrop, January 21, 2003: US06509951 (16 worldwide citation)

In a lithographic projection apparatus a first part is shielded from a second part by a heat shield. The first part is required to have a temperature of a predetermined value and the second part has a characteristic that may influence the temperature of the first part. The characteristic may be a te ...


7
Yim Bun P Kwan, Engelbertus A F van de Pasch, Andreas B G Ariens, Edwin J Buis, Jan F Hoogkamp, Robert Han Munnig Schmidt: Crash prevention in positioning apparatus for use in lithographic projection apparatus. ASML Netherlands, Pillsbury Winthrop, December 24, 2002: US06498350 (11 worldwide citation)

In a multi-table lithographic apparatus in which substrate tables may be exchanged between a first working zone where substrates are loaded onto and removed from the table and a second working zones where wafers are exposed, collision prevention means are provided to prevent collisions between table ...


8
Yim Bun P Kwan, Serge F C L Wetzels, Gerjan P Veldhuis: Positioning system for use in lithographic apparatus. ASML Netherlands, Pillsbury Winthrop, February 8, 2005: US06852989 (8 worldwide citation)

A positioning system, such as may be used to position a moveable object table in three degrees of freedom. More particularly, the invention relates to the use of the positioning system in a lithographic projection apparatus including an illumination system for supplying a projection beam of radiatio ...


9
Yim Bun P Kwan: Balanced positioning system for use in lithographic apparatus. ASML Netherlands, Pillsbury Winthrop, December 30, 2003: US06671036 (8 worldwide citation)

A balanced positioning system for use in lithographic apparatus having a pair of balance masses which are supported so as to be moveable in at least one degree of freedom, such as Y translation. Oppositely directed drive forces in this degree of freedom act directly between the driven body and the b ...


10
Edwin J Buis, Noud J Gilissen, Yim Bun P Kwan, Paulus H C M Schapendonk: Cooling of voice coil motors in lithographic projection apparatus. ASML Netherlands, Pillsbury Winthrop, December 2, 2003: US06657204 (7 worldwide citation)

A voice coil motor used in a positioning means associated with either a first object table or a second object table in which the coil is cooled with a cooling jacket in thermal contact with the coil, the cooling jacket comprising at least one channel for circulation of a cooling fluid, the or each c ...