1
Fang Cheng Chang, Yao Ting Wang, Yagyensh C Pati: Design rule checking system and method. Numerical Technologies, Mark A Haynes, Haynes Beffel & Wolfeld, October 22, 2002: US06470489 (354 worldwide citation)

A method for performing design rule checking on OPC corrected or otherwise corrected designs is described. This method comprises accessing a corrected design and generating a simulated image. The simulated image corresponds to a simulation of an image which would be printed on a wafer if the wafer w ...


2
Fang Cheng Chang, Yao Ting Wang, Yagyensh C Pati: Data hierarchy layout correction and verification method and apparatus. Numerical Technologies, Mark A Haynes, Haynes Beffel & Wolfeld, April 9, 2002: US06370679 (299 worldwide citation)

A method and apparatus for the correction of integrated circuit layouts for optical proximity effects which maintains the original true hierarchy of the original layout is provided. Also provided is a method and apparatus for the design rule checking of layouts which have been corrected for optical ...


3
Yao Ting Wang, Yagyensh C Pati: Phase shifting circuit manufacture method and apparatus. Numerical Technologies, Wilson Sonsini Goodrich & Rosati, January 12, 1999: US05858580 (275 worldwide citation)

A method and apparatus for creating a phase shifting mask and a structure mask for shrinking integrated circuit designs. One embodiment of the invention includes using a two mask process. The first mask is a phase shift mask and the second mask is a single phase structure mask. The phase shift mask ...


4
Fang Cheng Chang, Yao Ting Wang, Yagyensh C Pati, Linard N Karklin: Visual inspection and verification system. Numerical Technologies, June 29, 2004: US06757645 (120 worldwide citation)

A method and apparatus for inspecting a photolithography mask for defects is provided. The inspection method comprises providing a defect area image to an image simulator wherein the defect area image is an image of a portion of a photolithography mask, and providing a set of lithography parameters ...


5
Fang Cheng Chang, Yao Ting Wang, Yagyensh C Pati: Method and apparatus for data hierarchy maintenance in a system for mask description. Numerical Technologies, Mark A Haynes, Haynes Beffel & Wolfeld, September 17, 2002: US06453452 (91 worldwide citation)

A method and apparatus for performing an operation on hierarchically described integrated circuit layouts such that the original hierarchy of the layout is maintained is provided. The method comprises providing a hierarchically described layout as a first input and providing a particular set of oper ...


6
Fang Cheng Chang, Yao Ting Wang, Yagyensh C Pati, Linard Karklin: Visual analysis and verification system using advanced tools. Synopsys, Beaver Hoffman & Harms, Jeanette S Harms, September 12, 2006: US07107571 (56 worldwide citation)

A system and method of analyzing defects on a mask used in lithography are provided. A defect area image is provided as a first input, a set of lithography parameters is provided as a second input, and a set of metrology data is provided as a third input. The defect area image comprises an image of ...


7
Deepak Agrawal, Fang Cheng Chang, Hyungjip Kim, Yao Ting Wang, Myunghoon Yoon: General purpose shape-based layout processing scheme for IC layout modifications. Numerical Technologies, Erik L Oliver, Jeanette S Harms, Bever Hoffman & Harms, February 18, 2003: US06523162 (51 worldwide citation)

Layout processing can be applied to an integrated circuit (IC) layout using a shape-based system. A shape can be defined by a set of associated edges in a specified configuration. A catalog of shapes is defined and layout processing actions are associated with the various shapes. Each layout process ...


8
Christophe Pierrat, You Ping Zhang, Fang Cheng Chang, Hoyong Park, Yao Ting Wang: Method and apparatus for mixed-mode optical proximity correction. Numerical Technologies, June 24, 2003: US06584609 (41 worldwide citation)

A semiconductor layout testing and correction system is disclosed. The system combines both rule-based optical proximity correction and model-based optical proximity correction in order to test and correct semiconductor layouts. In a first embodiment, a semiconductor layout is first processed by a r ...


9
Christophe Pierrat, Chin hsen Lin, Yao Ting Wang, Fang Cheng Chang: Method and apparatus for analyzing a layout using an instance-based representation. Numerical Technologies, Park Vaughan & Fleming, May 6, 2003: US06560766 (38 worldwide citation)

One embodiment of the invention provides a system that analyzes a layout related to a circuit on a semiconductor chip using an instance-based representation of a set of geometrical features that comprise the layout. The system operates by receiving a representation of the layout, wherein the represe ...


10
Yao Ting Wang, Yagyensh Pati: Phase shifting circuit manufacture method and apparatus. Numerical Technologies, Mark A Haynes, Haynes & Beffel, May 8, 2001: US06228539 (35 worldwide citation)

A method and apparatus for creating a phase shifting mask and a structure mask for shrinking integrated circuit designs. One embodiment of the invention includes using a two mask process. The first mask is a phase shift mask and the second mask is a single phase structure mask. The phase shift mask ...