1
Katherina Babich
Dirk Pfeiffer, Marie Angelopoulos, Katherina Babich, Phillip Brock, Wu Song Huang, Arpan P Mahorowala, David R Medeiros, Ratnam Sooriyakumaran: Antireflective SiO-containing compositions for hardmask layer. International Business Machines Corporation, Steven Capella, May 4, 2004: US06730454 (50 worldwide citation)

Antireflective compositions characterized by the presence of an SiO-containing polymer having chromophore moieties and transparent moieties are useful antireflective hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity prope ...


2
Katherina Babich
Dirk Pfeiffer, Marie Angelopoulos, Katherina Babich, Phillip Brock, Wu Song Huang, Arpan P Mahorowala, David R Medeiros, Ratnam Sooriyakumaran: Antireflective SiO-containing compositions for hardmask layer. International Business Machines Corporation, Steven Capella, International Bussiness Machines Corporation, October 23, 2003: US20030198877-A1

Antireflective compositions characterized by the presence of an SiO-containing polymer having chromophore moieties and transparent moieties are useful antireflective hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity prope ...


3
Marie Angelopoulos, Ari Aviram, C Richard Guarnieri, Wu Song Huang, Ranee Kwong, Wayne M Moreau: Antireflective silicon-containing compositions as hardmask layer. International Business Machines Corporation, Steven Capella, July 16, 2002: US06420088 (91 worldwide citation)

Antireflective compositions characterized by the presence of an SiO-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties whi ...


4
Kuang Jung Chen, Ricardo A Donaton, Wu Song Huang, Wai Kin Li: Method for removing threshold voltage adjusting layer with external acid diffusion process. International Business Machines Corporation, Scully Scott Murphy & Presser P C, Yuanmin Cai, July 24, 2012: US08227307 (85 worldwide citation)

The present invention provides a method of forming a threshold voltage adjusted gate stack in which an external acid diffusion process is employed for selectively removing a portion of a threshold voltage adjusting layer from one device region of a semiconductor substrate. The external acid diffusio ...


5
Marie Angelopoulos, Wu Song Huang, Richard D Kaplan, Marie Annick Le Corre, Stanley E Perreault, Jane M Shaw, Michel R Tissier, George F Walker: Electrically conductive polymeric. International Business Machines Corporation, Daniel P Morris, March 30, 1993: US05198153 (78 worldwide citation)

Structures containing conducting polymers and methods of fabrication thereof. Electrical conductivity can be induced in polymers selected from the group of substituted and unsubstituted polyanilines, polyparaphenylenvinyles, substituted and unsubstituted polythiophenes substituted and unsubstituted ...


6
Kuang Jung R Chen, Mark C Hakey, Steven J Holmes, Wu Song Huang, Paul A Rabidoux: Hybrid resist based on photo acid/photo base blending. International Business Machines Corporation, William D Sabo, Schmeiser Olsen & Watts, January 15, 2002: US06338934 (71 worldwide citation)

A photo resist composition contains a polymer resin, a first photo acid generator (PAG) requiring a first dose of actinic energy to generate a first photo acid, and a photo base generator (PBG) requiring a second dose of actinic energy, different from the first dose, to generate a photo base. The am ...


7
Marie Angelopoulos, Wu Song Huang, Jae M Park, James R White: Fabrication of printed circuit boards using conducting polymer. International Business Machines Corporation, Philip J Feig, Stephen C Kaufman, April 5, 1994: US05300208 (61 worldwide citation)

A process for fabricating a printed circuit board concerns the use of a soluble, air-stable conducting polymer applied to plated through holes, blind holes or vias or to a predetermined portion of the printed circuit board surface for selectively metal plating on the polymer without the necessity of ...


8
Wu Song Huang, Igor Y Khandros, Ravi Saraf, Leathen Shi: Solder/polymer composite paste and method. International Business Machines Corporation, Perman & Green, November 5, 1991: US05062896 (49 worldwide citation)

An improved solder/polymer fluxless composite paste interconnection material having a low reflow temperature to form electrical contacts having good bonding strength and low contact resistance. The present pastes comprise a major proportion of a meltable metal alloy powder filler, free of noble meta ...


9
Marie Angelopoulos, Ari Aviram, C Richard Guarnieri, Wu Song Huang, Ranee Kwong, Wayne M Moreau: Antireflective silicon-containing compositions as hardmask layer. International Business Machines Corporation, Steven Capella, January 7, 2003: US06503692 (41 worldwide citation)

Antireflective compositions characterized by the presence of an SiO-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties whi ...


10
Marie Angelopoulos, Ari Aviram, C Richard Guarnieri, Wu Song Huang, Ranee Kwong, Robert N Lang, Arpan P Mahorowala, David R Medeiros, Wayne M Moreau: Mask-making using resist having SIO bond-containing polymer. International Business Machines Corporation, Steven Capella, July 16, 2002: US06420084 (38 worldwide citation)

The invention provides improved resist compositions and lithographic methods using the resist compositions of the invention. The resist compositions of the invention are acid-catalyzed resists which are characterized by the presence of an SiO-containing polymer. The invention also encompasses method ...