1
Santiago del Puerto, Erik R Loopstra, Andrew Massar, Duane P Kish, Abdullah Alikhan, Woodrow J Olson, Jonathan H Feroce: System for using a two part cover for protecting a reticle. ASML Holding, Sterne Kessler Goldstein & Fox P L L C, June 14, 2005: US06906783 (37 worldwide citation)

A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or b ...


2
Santiago del Puerto, Erik R Loopstra, Andrew Massar, Duane P Kish, Abdullah Alikhan, Woodrow J Olson, Jonathan H Feroce: System for using a two part cover for and a box for protecting a reticle. ASML Holding, Sterne Kessler Goldstein & Fox P L L C, April 24, 2007: US07209220 (17 worldwide citation)

A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or b ...


3
Santiago del Puerto, Eric R Loopstra, Andrew Massar, Duane P Kish, Abdullah Alikhan, Woodrow J Olson, Jonathan H Feroce: System for using a two part cover for protecting a reticle. ASML Holding, Sterne Kessler Goldstein and Fox P L L C, December 4, 2007: US07304720 (16 worldwide citation)

A system and method are used to protect a mask from being contaminated by airborne particles. They include coupling a reticle and a cover to protect the reticle. The cover includes a frame and a movable panel that moves to allow direct access of light to the reticle during an exposure process. The r ...


4
Santiago del Puerto, Erik R Loopstra, Andrew Massar, Duane P Kish, Abdullah Alikhan, Woodrow J Olson, Jonathan H Feroce: System and method for using a two part cover for protecting a reticle. ASML Netherlands, Sterne Kessler Goldstein & Fox Pllc, November 27, 2003: US20030218728-A1 (1 worldwide citation)

A system and method are used to protect a mask from being contaminated by airborne particles. They include coupling a reticle and a cover to protect the reticle. The cover includes a frame and a movable panel that moves to allow direct access of light to the reticle during an exposure process. The r ...


5
Santiago del Puerto, Erik R Loopstra, Andrew Massar, Duane P Kish, Abdullah Alikhan, Woodrow J Olson, Jonathan H Feroce: System and method for using a two part cover for protecting a reticle. ASML Netherlands, Sterne Kessler Goldstein & Fox Pllc, December 11, 2003: US20030227605-A1

A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or b ...


6
Santiago del Puerto, Erik R Loopstra, Andrew Massar, Duane P Kish, Abdullah Alikhan, Woodrow J Olson, Jonathan H Feroce: System and method for using a two part cover and a box for protecting a reticle. ASML Holding, Sterne Kessler Goldstein & Fox Pllc, November 8, 2007: US20070258061-A1

Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can b ...


7
Santiago del Puerto, Erik R Loopstra, Andrew Massar, Duane P Kish, Abdullah Alikhan, Woodrow J Olson, Jonathan H Feroce: System and method for using a two part cover for and a box for protecting a reticle. ASML Holding, Sterne Kessler Goldstein & Fox Pllc, April 27, 2006: US20060087639-A1

A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or b ...


8
Santiago del Puerto, Erik R Loopstra, Andrew Massar, Duane P Kish, Abdullah Alikhan, Woodrow J Olson, Jonathan H Feroce: System and Method for Using a Two Part Cover and a Box for Protecting a Reticle. ASML Holding, Sterne Kessler Goldstein & Fox Pllc, January 6, 2011: US20110001955-A1

Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can b ...